Asml Holding N.v.

Asml Netherlands B.v.

Asml Holdings N.v.

Herman Vogel

Nicolaas Ten Kate

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Franciscus Johannes Herman Maria Teunissen

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Klaus Simon

Antonius Theodorus Anna Maria Derksen

Joost Jeroen Ottens

Edwin Augustinus Matheus Van Gompel

Marco Polizzi

Martinus Hendrikus Antonius Leenders

Tjarko Adriaan Rudolf Van Empel

Ronald Van Der Ham

Niek Jacobus Johannes Roset

Daniel Nicholas Galburt

Johannes Onvlee

Frank Johannes Jacobus Van Boxtel

Christopher Charles Ward

Laurentius Johannes Adrianus Van Bokhoven

Jeroen Gerard Gosen

Daniel Nathan Burbank

Michael Parisi

Bart Dinand Paarhuis

George Hilary Harrold

Geoffrey Alan Schultz

Roelof Frederick De Graaf

Jinggao Li

Florence Luo

Santiago E Delpuerto

Thomas Venturino

Martinus Hendrukus Antonius Leenders

Martinus Cornelius Maria Verhagen

Sjoerd Donders

Jeroen Mertens

Henrikus Cox

Stefan Belfroid

Franciscus Teunissen

Martinus Verhagen

Johannes Smeulers

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

Reticle cooling by non-uniform gas flow

A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

Immersion photolithography system and method using microchannel nozzles

An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. Further, the liquid is extracted using a two dimensional array of extraction openings.

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. The liquid supply system including a plurality of inlets to supply the liquid to the space, the inlets located between the table and a surface of the optical element, the surface arranged to be in contact with the liquid.

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Sandy Hook, CT, United States of America

Herman Vogel