Asml Netherlands B.v.

Asml Holding N.v.

Herman Boom

Erik Roelof Loopstra

Jeroen Johannes Sophia Maria Mertens

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Johannes Catharinus Hubertus Mulkens

Richard Joseph Bruls

Richard Moerman

Nicolaas Ten Kate

Joost Jeroen Ottens

Johannes Henricus Wilhelmus Jacobs

Martinus Cornelis Maria Verhagen

Franciscus Johannes Joseph Janssen

Christiaan Alexander Hoogendam

Johannes Jacobus Matheus Baselmans

Hans Jansen

Timotheus Franciscus Sengers

Marcel Mathijs Theodore Marie Dierichs

Sergei Shulepov

Ronald Walther Jeanne Severijns

Patricius Aloysius Jacobus Tinnemans

Michel Riepen

Marco Koert Stavenga

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Petrus Maria Cadee

Boris Menchtchikov

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Koen Goorman

Marcel Johannus Elisabeth Hubertus Muitjens

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Maria Elisabeth Reuhman-Huisken

Marcel Beckers

Carlo Cornelis Maria Luijten

Aschwin Lodewijk Hendricus Johannes Van Meer

Aschwin Lodewijk Hendricus Johannes Vermeer

Huibert Visser

Tammo Uitterdijk

Borgert Kruizinga

Igor Petrus Maria Bouchoms

Johannes Van Es

Yücel Kök

Peter Julian Pollard

Martinus Hendrickus Antonius Leenders

Joseph Laganza

Orlando Serapio Cicilia

Mana Elisabeth Reuhman-Huisken

Jacobus Johannus Leonardus Hendricus Verspaij

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.

Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder

Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.

Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Herman Boom