National University of Singapore

Imm, Institut Fur Mikrotechnik Gmbh

Agency for Science, Technology and Research

Nanyang Technological University

Pohang University of Science and Technology Foundation

Herbert Oskar Moser

Wolfgang Ehrfeld

Klaus Mullen

Sascha Pierre Heussler

Christoph Bubeck

Hans-Dieter Bauer

Lei Huang

Adrian Paul Burden

Gyu-Chul Yi

Marian Cholewa

Shu Ping Lau

Jin Kyoung Yoo

Caozheng Diao

Xingyu Gao

Alok Pathak

Andrew Thye Shen Wee

An optical interference device is disclosed herein. In a described embodiment, the optical interference device comprises a phase shifter array for receiving a collimated beam of light. The phase shifter array includes an array of cells for producing optical light channels from respective rays of the collimated beam of light, with at least some of the optical light channels having varying phase shifts. The optical interference device further includes a focusing lens having a focal distance and arranged to simultaneously produce, from the optical light channels, a focused beam of light in its focal plane and an image downstream the phase shifter array for detection by an optical detector. The optical interference device also includes an optical spatial filter arranged at the focal distance of the focusing lens and arranged to filter the focused beam of light to produce a spatially distributed interference light pattern in zeroorder for detection by the optical detector. A method for producing a spatially distributed interference light pattern is also disclosed.

Optical interference device

A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask having an exposure pattern for forming a three dimensional structure; (ii) exposing the first mask to radiation to form the exposure pattern on a radiation-sensitive resist; the exposure pattern defined by irradiated areas and non-irradiated areas of the resist; (ii) providing a second mask; and (iii) during exposure, changing relative positions between the first mask and the second mask to shield selected portions of the irradiated areas from radiation to enable varying depth profiles to be created in the three dimensional structure.

Lithography method and apparatus

A miniundulator that includes a first bobbin and a second bobbin parallel to and spaced from the first bobbin, and a superconductive wire wound around the outer surfaces of the first bobbin and the second bobbin, and method for the assembly of the miniundulator are disclosed.

Single-coil superconducting miniundulator

A radiation detector has an electron emitter that includes a coated nanostructure on a support. The nanostructure can include a plurality of nanoneedles. A nanoneedle is a shaft tapering from a base portion toward a tip portion. The tip portion has a diameter between about 1 nm to about 50 nm and the base portion has a diameter between about 20 nm to about 300 nm. Each shaft has a length between about 100 nm to about 3,000 nm and an aspect ratio larger than 10. A coating covers at least the tip portions of the shafts. The coating exhibits negative electron affinity and is capable of emitting secondary electrons upon being irradiated by radiation. The nanostructure can also include carbon nanotubes (CNTs) coated with a material selected from the group of aluminum nitride (AlN), gallium nitride (GaN), and zinc oxide (ZnO). The detector further includes an electron collector positioned to collect electrons emitted from the electron emitter and to produce a signal indicative of the amount of electrons collected, and a signal processor operatively connected to the electron collector for processing the signal to determine a characteristic of the radiation. The detector can be used to detect radiations of changed particles or light such as X-ray.

Radiation detector having coated nanostructure and method

A method to produce nonlinear optical microcomponents is described which makes it possible to employ material combinations not yet used to date. By means of X-ray depth lithography not only waveguide structures, but also microcell structures are produced, into which subsequently material of nonlinear optical properties is placed. By means of X-ray depth lithography and micromolding techniques a mold insert with a waveguide structure is produced as a positive mold, and the waveguide structure is impressed into a polymer base material by means of the mold insert. Then the impressed waveguide structure is filled with optically linear material, and after the filling operation at least one microcell structure is produced, at least in the areas of the optically linear material, into which microcell structure optically nonlinear material is placed. The microcell structure may also be impressed by means of another mold insert.

Method to produce nonlinear optical microcomponents

A method to produce nonlinear optical microcomponents is described which employs hitherto not yet used material combinations. Not only waveguide structures are produced by means of X-ray depth lithography, but also microcell structures, into which materials having nonlinear optical properties are introduced. The microstructure is produced as a positive mold part, from which there is subsequently generated, by means of electroforming, a mold insert, a negative of which is made using a polymer material. After the molding operation the microstructure is applied to a substrate, and nonlinear optical material, covered by a cover plate if needed or desired, is introduced into the microcell structure.

Growing community of inventors

Karlsruhe, Germany

Herbert Oskar Moser