Asml Netherlands B.v.

Henryk Fiedorowicz

Frederik Bijkerk

Andrzej Bartnik

Vadim Yevgenyevich Banine

Konstantin Nikolaevitch Koshelev

Cornelis Cornelia De Bruijn

Cornelis C De Bruijn

A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle constructed and arranged to eject a primary gas or liquid in a first direction; a supply for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle constructed and arranged to eject a secondary gas or liquid in the first direction and positioned aside, possibly enclosing, the primary jet nozzle ; and a supply for the secondary gas or liquid.

Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus

A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.

Radiation source for use in lithographic projection apparatus

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Warszawa, Poland

Henryk Fiedorowicz