Stauffer Chemical Company

Henry S Marek

John A Baumann

Christian G Michel

Mark A Kuck

MP.sub.15, where M is an alkali metal is used in a generator of P.sub.4 gas. KP.sub.15 is preferred. The generator is heated to produce the P.sub.4 gas. The generator may be used in various deposition processes such as chemical vapor deposition, vacuum evaporation, and molecular beam deposition. It is particularly useful in high vacuum processes below 10.sup.-3 Torr, particularly below 10.sup.-4 Torr such as vacuum evaporation and molecular beam deposition, for example vapor phase epitaxy and molecular beam epitaxy.

P.sub.4 gas generator using the alkali metal polyphosphide MP.sub.15

Polycrystalline and monocrystalline potassium polyphosphide, KP.sub.15, has been grown from the liquid phase at a temperature range of 600.degree.-700.degree. C. Massive crystallization of KP.sub.15 whiskers and platelets is observed. Crystalline KP.sub.15 films have been grown on gallium arsenide (110) and gallium phosphide (111) polished wafers, silicon (110) polished wafers, quartz, on a nickel evaporated 2000 angstrom nickel layer on quartz, and on nickel foil. Microcrystalline KP.sub.15 formed by a condensed phase process is incorporated into a sealed ampule evacuate 10.sup.-4 torr. The temperature is raised to 655.degree. C. and the furnace tilted to bring the melt in contact with the substrates. The temperature is then reduced to 640.degree. C. and the furnace is tilted back to the original position. Large KP.sub.15 whiskers several millimeters in size are grown from the melt and crystalline films of KP.sub.15 are grown topotaxially on gallium arsenide and gallium phosphide. Crystalline platelets of KP.sub.15 3.times.3 mm have been obtained by cleaving the grown film from a gallium phosphide substrate.

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Mount Vernon, NY, United States of America

Henry S Marek