Atotech Deutschland Gmbh

Henry Kunze

Ferdinand Wiener

Reinhard Schneider

Uwe Hauf

Lorenz Kopp

Christian Thomas

Heinz Klingl

Britta Scheller

In order to remove treatment liquid () from a planar material to be treated (), which is transported in an assembly for the electrolytic or wet-chemical treatment of the material to be treated (), or to promote the exchange of material on the surface of the material to be treated (), a roll with a roll surface () is provided. The roll surface () is arranged relative to a transport path of the material to be treated () so that a gap () remains between the roll surface () and a useful region of the material to be treated () opposing the roll surface (), which extends over the useful region. The roll is driven rotatably so that at the gap () a relative speed is produced between the roll surface () and the material to be treated ().

Method, treatment station and assembly for treating a planar material to be treated

In order to transport a flat material to be treated () in an installation for the chemical and/or electrochemical treatment of said material, within which the material to be treated () is transported within a plane of transport in a direction of transport (), holding means () are attached to said material to be treated (). The holding means () hold the material to be treated () at at least two points on an edge region of said material, which edge region is directed along the direction of transport () when said material to be treated () is being transported. The holding means () are coupled in a detachable manner to a transporting device () which moves said holding means () in the direction of transport in order to transport the material to be treated (). At least during a portion of the transportation of the material to be treated (), a force () having a component which lies within the plane of transport and is directed transversely to the direction of transport (), is exerted upon a region of the material to be treated (), for example upon the longitudinal edge regions.

Method, holding means, apparatus and system for transporting a flat material to be treated and loading or unloading apparatus

In order to remove treatment liquid () from a planar material to be treated (), which is transported in an assembly for wet-chemical treatment of the material to be treated (), a retaining surface () is provided for holding back the treatment liquid (). The retaining surface () is arranged relative to a transport path of the material to be treated () so that a gap () remains between the retaining surface () and a surface of the material to be treated () opposing the retaining surface (), when the material to be treated () is moved past the retaining surface (). The retaining surface () may, for example, be provided as an offset portion of a peripheral surface of a roll ().

Method and assembly for treating a planar material to be treated and device for removing or holding off treatment liquid

Apparatus for the electrolytic treatment of the product L using a treatment agent is used to make the treatment of a plate-shaped product more uniform. This apparatus includes devicesfor retaining the product L in the apparatus, one or more flow devices, which each include at least one nozzleand are disposed situated opposite the product L, one or more counter electrodes, which are inert relative to the treatment agent and are disposed parallel to at least one treatment surface, eccentric motor means for generating a relative movementbetween the product L, on the side, and the flow devicesand/or the counter electrodes, on the other side, in at least one direction parallel to a treatment surface. The product L can be immersed in the treatment agent during treatment.

Apparatus and method for the electrolytic treatment of a plate-shaped product

Vertical system for the plating treatment of a work piece, the system comprising at least two treatment modules, wherein retaining devices for the work pieces are provided in the treatment modules, and at least one transport device including at least one gripping device, which retains the work piece and has a respective fastening device, and each fastening device comprises first and second clamping devices, each associated with one side of the work piece, wherein both the first and second clamping devices are displaceable for gripping and releasing the work pieces, wherein the gripping device comprises at least two fastening devices that are spaced apart from one another, each of the first and second clamping devices are moveable torsion bars as a result of which the work piece is tensioned between the fastening devices during clamping parallel to its first side.

Vertical system for the plating treatment of a work piece and method for conveying the work piece

The present invention relates to treatment units for the wet-chemical or electrolytic treatment of flat workpieces (), such as metal foils, printed circuit foils or printed circuit boards, in which the workpieces () are transported on a conveying path by means of conveying members (). The treatment unit comprises carrier elements () with recesses (), said carrier elements () being oriented to be parallel to the conveying path, and at least one module system for carrying the conveying members () that consist of insertion elements (), preferably arranged in pairs, the at least one module system being configured such that it registers with and is preferably slidable into the recesses () of the carrier elements (). The treatment unit is preferably utilized in horizontal conveyorized lines.

Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces

A nozzle arrangement is described which may in particular be used as a flow nozzle in galvanization systems with horizontal throughput of printed-circuit boards. The nozzle arrangement comprises a longitudinal housing () with at least one fluid feed opening to feed a treatment fluid for treating a work piece, for example a printed-circuit board, and preferably a plurality of slotted fluid delivery openings () for releasing the treatment fluid. In the housing () a fluid channel () is formed for feeding the treatment fluid from the fluid feed opening to the fluid delivery openings (). In order to achieve the most even possible flow speed of the treatment fluid at the fluid delivery openings (), (a) the throughput of the fluid channel () for the treatment fluid reduces continuously from the fluid feed opening in the longitudinal direction of the housing () and/or (b) before the delivery of the fluid from the fluid delivery openings () a storage chamber is provided.

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Wendelstein, Germany

Henry Kunze