Wisconsin Alumni Research Foundation

Honeywell G.m.b.h.

Airco, Inc.

Henry Guckel

Todd R Christenson

David W Burns

Kenneth J Skrobis

Jonathan L Klein

Jeffry Sniegowski

Harald Emmerich

Steven T Larsen

Yogesh B Gianchandani

Kevin Fischer

Thomas L Earles

James D Zook

Eric Warren Stiers

Shamus P McNamara

Pawitterjit S Mangat

Todd R Christensen

Erik D Johnson

David Peter Siddons

Ned Tabat

A micromechanical actuator includes a plunger, having two magnet heads spaced from each other and joined to move together, that is supported for linear movement on a substrate. A magnetic core is supported on the substrate and has gaps in the core adjacent to the heads of the plunger. At least one permanent magnet is mounted to the plunger to move with it and forms, with the core, first and second magnetic circuits for flux which pass through the first and second heads of the plunger. A coil is coupled to the magnetic core to provide flux to the core. When the coil is supplied with DC current in one direction, the flux from the coil opposes the flux from the permanent magnet in one of the gaps and augments the flux in the other gap, causing the plunger to move in the direction of the gap having the augmented flux. After the plunger has switched positions, the electrical current in the coil is turned off, leaving the plunger latched in its switched position due to the flux from the permanent magnet. Switching to the opposite position of the plunger is carried out by supplying current to the coil in the reverse direction, drawing the plunger to its opposite position.

Bi-directional micromechanical latching linear actuator

Photodiode arrays are formed with close diode-to-diode spacing and minimized cross-talk between diodes in the array by isolating the diodes from one another with trenches that are formed between the photodiodes in the array. The photodiodes are formed of spaced regions in a base layer, each spaced region having an impurity type opposite to that of the base layer to define a p-n junction between the spaced regions and the base layer. The base layer meets a substrate at a boundary, with the substrate being much more heavily doped than the base layer with the same impurity type. The trenches extend through the base layer and preferably into the substrate. Minority carriers generated by absorption of light photons in the base layer can only migrate to an adjacent photodiode through the substrate. The lifetime and the corresponding diffusion length of the minority carriers in the substrate is very short so that all minority carriers recombine in the substrate before reaching an adjacent photodiode.

Photodiode arrays having minimized cross-talk between diodes

A positioning system adapted for use with micromechanical actuators provides feedback control of the position of the movable element of the actuator utilizing a low Q sensing coil. The effective inductance of the sensing coil changes with position of the movable element to change the frequency of oscillation of a variable oscillator. The output of the variable oscillator is compared in a phase detector to a reference oscillator signal. The phase detector provides a pulsed output having a pulse duty cycle related to the phase or frequency difference between the oscillator signals. The output of the phase detector is provided to a drive coil which applies a magnetic force to the movable element which balances the force of a spring. The movable element can be displaced to a new position by changing the frequency of the reference oscillator.

Position control system for use with micromechanical actuators

The present invention provides a procedure for achieving accurate alignment between an X-ray mask and a device substrate for the fabrication of multi-layer microstructures. A first photoresist layer on the substrate is patterned by a first X-ray mask to include first alignment holes along with a first layer microstructure pattern. Mask photoresist layers are attached to second and subsequent masks that are used to pattern additional photoresist layers attached to the microstructure device substrate. The mask photoresist layers are patterned to include mask alignment holes that correspond in geometry to the first alignment holes in the first photoresist layer on the device substrate. Alignment between a second mask and the first photoresist layer is achieved by assembly of the second mask onto the first photoresist layer using alignment posts placed in the first alignment holes in the first photoresist layer that penetrate into the mask alignment holes in the mask photoresist layers. The alignment procedure is particularly applicable to the fabrication of multi-layer metal microstructures using deep X-ray lithography and electroplating. The alignment procedure may be extended to multiple photoresist layers and larger device heights using spacer photoresist sheets between subsequent masks and the first photoresist layer that are joined together using alignment posts.

Radiation mask adapted to be aligned with a photoresist layer and method

Alignment method for multi-level deep x-ray lithography utilizing

Micromechanical actuators capable of bidirectional and bistable operation can be formed on substrates using lithographic processing techniques. Bistable operation of the microactuator is obtained using a single coil and a magnetic core with a gap. A plunger having two magnetic heads is supported for back and forth linear movement with respect to the gap in the magnetic core, and is spring biased to a neutral position in which the two heads are on each side of the gap in the core. The single electrical coil is coupled to the core and is provided with electrical current to attract one of the heads toward the core by reluctance action to drive the plunger to a limit of travel in one direction. The current is then cut off and the plunger returns by spring action toward the gap, whereafter the current is reapplied to the coil to attract the other head of the plunger by reluctance action to drive the plunger to its other limit of travel. This process can be repeated at a time when switching of the actuator is required.

Single coil bistable, bidirectional micromechanical actuator

A method and apparatus for planarizing photoresist and/or metal microstructure layers is provided. Planarization is achieved by removing material from a workpiece by lapping using a diamond containing lapping slurry. A lapping machine is furnished with a lapping plate made of a soft metal material. The lapping plate is furnished with ridges of controlled height using a diamond conditioning ring with a specified grit size. Free diamonds in a liquid slurry are then sprayed onto the plate and embedded therein by a second conditioning ring. After the lapping plate is conditioned, the piece to be lapped is mounted on the lapping plate. A vacuum hold fixture or flat steel or glass mounting plate may be used. During lapping, additional diamond slurry is sprayed onto the lapping plate and driven into the plate by a ceramic conditioning ring. The size of diamonds in the diamond slurry are selected to control the shear forces applied to the surface being lapped and to achieve a desired surface finish. Polishing, using a cloth covered hard metal polishing plate and loose diamond slurry, may be employed after lapping to provide a smooth optical surface finish. The lapping and polishing method and apparatus of the present invention may be used for z-dimension height control, re-planarization, and surface finishing of precise single or multiple level photoresist-metal layers, or of individual preformed photoresist sheets or laminates thereof.

Lapping and polishing method and apparatus for planarizing photoresist

An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures.

Method and apparatus for micromachining using hard X-rays

Micromechanical structures capable of actuation for purposes such as fluid flow control are formed on substrates in sizes in the range of one or two millimeters or less using micromechanical processing techniques. A magnetic core having a gap therein is fixed on the substrate, and a plunger is mounted by a spring for movement parallel to the substrate in response to the flux provided to the gap of the fixed core. An electrical coil wound around a mandrel is engaged to the fixed magnetic core such that flux is induced in the core when current is supplied to the coil, driving the plunger against the force of the spring. A micromechanical fluid control unit includes a metal frame structure formed by electrodeposition on a substrate with the inner wall of the frame having slots formed therein to admit a separator wall which divides the interior of the frame into separate chambers, with a cover secured over the top of the frame and the separator wall to seal the chambers. A plunger actuator can be mounted within the frame with fixed core sections extending through the walls of the frame, and with the mandrel and coil engaged to the fixed core sections outside of the frame to provide magnetic flux to a gap to actuate the plunger within the sealed enclosure.

Micromechanical magnetically actuated devices

In the formation of microstructures, a preformed sheet of photoresist, such as polymethylmethacrylate (PMMA), which is strain free, may be milled down before or after adherence to a substrate to a desired thickness. The photoresist is patterned by exposure through a mask to radiation, such as X-rays, and developed using a developer to remove the photoresist material which has been rendered susceptible to the developer. Micrometal structures may be formed by electroplating metal into the areas from which the photoresist has been removed. The photoresist itself may form useful microstructures, and can be removed from the substrate by utilizing a release layer between the substrate and the preformed sheet which can be removed by a remover which does not affect the photoresist. Multiple layers of patterned photoresist can be built up to allow complex three dimensional microstructures to be formed.

Formation of microstructures using a preformed photoresist sheet

The present invention relates to microstructures fabricated from semiconductor material and having a flexible member which is excited into various modes of resonance and in which such resonance is read optically. By coupling the microstructure to a surface or material of interest, a drive means will excite the flexible member into a characteristic resonance which when read optically gives indication of certain physical phenomena influencing the surface or material of interest. The microstructures of the present invention may be configured to self-resonate, as a so-called active device, under certain conditions. Many different physical phenomena may be quantified using the device of the present invention.

Opto-electro-mechanical device or filter, process for making, and

Microminiature pressure transducers are formed on semiconductor substrates such as silicon and include a membrane which spans a cavity over the substrate, with the membrane being mounted to and sealed to the substrate at the peripheral edges of the membrane. The bottom of the cavity forms an overpressure stop to prevent over deflections of the membrane toward the substrate. An overpressure stop formed as a bridge of a material such as nickel extends above the membrane and is spaced therefrom to allow the membrane to deflect freely under normal pressure situations but prevent over deflections. The thickness of the polysilicon membrane and the spacing between the membrane and the overpressure stops is preferably in the range of 10 micrometers or less, and typically in the range of one micrometer. The overpressure stop bridge is formed utilizing deep X-ray lithography to form a well-defined bridge structure. The gap between the membrane and the bottom surface of the bridge is established with a sacrificial layer, such as a polyimide film, which dissolves in a solvent. The transducer is formed utilizing processing techniques which do not affect the performance of the membrane as a pressure sensor and which allow the substrate to have further micromechanical or microelectronic devices formed thereon.

Micromachined differential pressure transducers

Micromechanical devices are formed on a substrate using a sacrificial layer deep X-ray lithography process to produce a rotating microrotor which is driven magnetically. The rotor typically has a diameter of a few hundred microns or less and is formed as a free structure which is assembled onto a hub formed on a substrate. Stator pole pieces are formed on the substrate of a ferromagnetic material surrounding the rotor, and are also preferably formed by a deep X-ray lithography process followed by electroplating of a ferromagnetic material such as nickel. The stator pole pieces are supplied with magnetic flux, such as from a current flowing through a conductor surrounding the magnetic pole pieces which is integrated with the pole pieces on the substrate. Separate electromagnets can also be utilized to provide the magnetic flux to the pole pieces to provide a rotating magnetic field in the region of the rotor to drive the rotor.

Growing community of inventors

Madison, WI, United States of America

Henry Guckel