The Boc Group, Inc.

Henry A Byorum

J Kirkwood Rough

Russell J Hill

John H Bower

John P Lehan

Ronald E Rambeau

A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.

Sputtering system using cylindrical rotating magnetron electrically

In a rotatable magnetron, a seal cartridge having vacuum seals integrated therein provides a seal between a seal housing of the magnetron support assembly and a spindle carried therein. The seal cartridge is axially movable with respect to the magnetron support assembly which enables its efficient removal and replacement therefrom. As such removal and replacement of the cartridge automatically accomplishes the removal and replacement of the integral vacuum seals, no handling or reassembly of the vacuum seals is required. The seal cartridge of the present invention provides a protected seal design which improves seal integrity in rotatable magnetrons.

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Monte Serano, CA, United States of America

Henry A Byorum