Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Henrikus Herman Marie Cox

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Frits Van Der Meulen

Jan-Gerard Cornelis Van Der Toorn

Sjoerd Nicolaas Lambertus Donders

Nicolaas Rudolf Kemper

Nicolaas Ten Kate

Franciscus Johannes Herman Maria Teunissen

Herman Vogel

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Martijn Houkes

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Erik Roelof Loopstra

Bob Streefkerk

Hans Butler

Sven Antoin Johan Hol

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Joeri Lof

Alexander Straaijer

Klaus Simon

Antonius Theodorus Anna Maria Derksen

Bernardus Antonius Slaghekke

Joost Jeroen Ottens

Harmen Klaas Van Der Schoot

Martinus Hendrikus Antonius Leenders

Koen Jacobus Johannes Maria Zaal

Petrus Matthijs Henricus Vosters

Gerardus Petrus Matthijs Van Nunen

Edwin Augustinus Matheus Van Gompel

Marco Polizzi

Hernes Jacobs

Minne Cuperus

Engelbertus Antonius Fransiscus Van Der Pasch

Wilhelmus Franciscus Johannes Simons

Sebastiaan Maria Johannes Cornelissen

Patricia Vreugdewater

Thomas Augustus Mattaar

Ronald Casper Kunst

Johannes Petrus Martinus Bernardus Vermeulen

Ronald Van Der Ham

Frank Johannes Jacobus Van Boxtel

Theodorus Wilhelmus Polet

Robert-Han Munnig Schmidt

Youssef Karel Maria De Vos

Jimmy Matheus Wilhelmus Van De Winkel

Ramidin Izair Kamidi

Gregory Martin Mason Corcoran

Mark Johannes Hermanus Frencken

Robertus Nicodemus Jacobus Van Ballegoij

Petrus Marinus Christianus Maria Van Den Biggelaar

Rob Jansen

Evert Hendrik Jan Draaijer

Antonius Henricus Arends

Godfried Katharina Hubertus Franciscus Geelen

Michel Pieter Dansberg

Robert Johannes Petrus Van Diesen

Gerardus Petrus Mattijs Van Nunen

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Raymond Wilhelmus Louis Lafarre

Levinus Pieter Bakker

Andre Bernardus Jeunink

Marc Wilhelmus Maria Van Der Wijst

Theodorus Petrus Maria Cadee

Jan Van Eijk

Emiel Jozef Melanie Eussen

Antonius Franciscus Johannes De Groot

Dominicus Jacobus Petrus Adrianus Franken

Edwin Johan Buis

Leon Martin Levasier

Bernardus Antonius Johannes Luttikhuis

Noud Jan Gilissen

Stoyan Nihtianov

Marcus Martinus Petrus Adrianus Vermeulen

Marcel Koenraad Marie Baggen

Johannes Hubertus Antonius Van De Rijdt

Jan Jaap Kuit

Martinus Agnes Willem Cuijpers

Marcel François Heertjes

Willem Herman Gertruda Anna Koenen

Mark Constant Johannes Baggen

Paul Petrus Joannes Berkvens

Fransiscus Mathijs Jacobs

Christiaan Louis Valentin

Peter Michel Silvester Maria Heijmans

Lambertus Adrianus Van Den Wildenberg

Jérôme François Sylvain Virgile Van Loo

Yin Tim Tso

Petrus Wilhelmus Josephus Maria Kemper

Franciscus Andreas Cornelis Johannes Spanjers

Johannes Heintze

Roelof Frederick De Graaf

Abdelhamid Kechroud

Theodorus Knoops

Martinus Godefridus Helena Boogaarts

Mark Marcus Gerardus Heeren

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

Lithographic apparatus and a device manufacturing method

An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized.

A position control system includes a position measurement system including a first position measurement configuration arranged to determine a position of an object in a first operating area and a second position measurement configuration to determine a position of the object in a second operating area; and a control unit configured to control a position of the object, the control unit including a first and a second controller, the first and second controllers being arranged to convert an input signal representing a position of the object to a respectively first and second control signal, the control unit being arranged to determine a combined control signal for controlling the position of the object in an overlapping area of the first and second operating area, wherein the combined control signal is obtained by applying a continuous weight function to the first and second control signal.

A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

Positioning system, a lithographic apparatus and a method for positional control

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Eindhoven, Netherlands

Henrikus Herman Marie Cox