Asml Netherlands B.v.

Henricus Jozef Castelijns

Nicolaas Ten Kate

Michel Riepen

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Niek Jacobus Johannes Roset

Laurentius Johannes Adrianus Van Bokhoven

Jim Vincent Overkamp

Hans Jansen

Raymond Wilhelmus Louis Lafarre

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Johannes Christiaan Leonardus Franken

Ramin Badie

Reinier Theodorus Martinus Jilisen

Wilbert Jan Mestrom

Albert Pieter Rijpma

Jacob Brinkert

Dennis Jozef Maria Paulussen

Peter Van Putten

Gerrit Van Der Straaten

Jan Okke Nieuwenkamp

Wim Ronald Kampinga

Brian Vernon Virgo

Bob Streefkerk

Marco Koert Stavenga

Marcel Beckers

Nina Vladimirovna Dziomkina

Koen Steffens

Leon Martin Levasier

Adrianus Hendrik Koevoets

Siegfried Alexander Tromp

Jeroen Gerard Gosen

Christianus Wilhelmus Johannes Berendsen

Koen Cuypers

Sandra Van Der Graaf

Hubertus Antonius Geraets

Albert Johannes Maria Jansen

Peter Schaap

Petrus Martinus Gerardus Johannes Arts

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOwhere A is an element from Group 2 of the Periodic Table; or TiOdoped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.

Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

Lithographic apparatus and a device manufacturing method

A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.

Lithographic apparatus, coverplate and device manufacturing method

In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.

Immersion lithographic apparatus and device manufacturing method

Growing community of inventors

Bladel, Netherlands

Henricus Jozef Castelijns