Asml Netherlands B.v.

Oce-technologies B.v.

Henricus Johannes Adrianus Van De Sande

Sjoerd Nicolaas Lambertus Donders

Patricius Aloysius Jacobus Tinnemans

Johannes Petrus Martinus Bernardus Vermeulen

Edwin Johan Buis

Jan Frederik Hoogkamp

Aschwin Lodewijk Hendricus Johannes Van Meer

Raimond Visser

Henricus Gerardus Tegenbosch

Patrick Johannes Cornelus Hendrik Smulders

Jan Van Elp

Franciscus Andreas Cornelis Johannes Spanjers

Johannes Charles Adrianus Van Den Berg

Gerardus Johannes Burger

Willem Maurits Hijmans

Dionysius Antionius Petrus Oudejans

Thijs Vervoort

A method of forming a nozzle and an ink chamber of an ink jet device, includes forming a nozzle passage by subjecting a substrate to a directional first etch process from one side of the substrate; applying a second etch process from the same side of the substrate for widening an internal part of the nozzle passage, to form a cavity forming at least a portion of the ink chamber adjacent to the nozzle; and controlling the shape of the cavity by providing, on the opposite side of the substrate, an etch accelerating layer buried under an etch stop layer and by allowing the second etch process to proceed into the etch accelerating layer. The following steps precede the first etch process: forming an annular trench in the substrate on the side of the substrate where the nozzle is to be formed; and passivating the walls of the trench so as to become resistant against the second etch process. The material surrounded by the trench is removed in the first etch process.

Method of forming a nozzle and an ink chamber of an ink jet device by etching a single crystal substrate

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Lithographic support structure

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Geldrop, Netherlands

Henricus Johannes Adrianus Van De Sande