Asml Netherlands B.v.

Henricus Gerardus Tegenbosch

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Dzmitry Labetski

Chunguang Xia

Andrew David LaForge

Christianus Wilhelmus Johannes Berendsen

Yue Ma

Klaus Martin Hummler

Marc Guy Langlois

Kornelis Frits Feenstra

Kerim Nadir

Arun Johnkadaksham

Matthias Kraushaar

Maksim Loginov

Seyedmohammad Mojab

Alexander Shatalov

John Tom Stewart

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Martinus Hendrikus Antonius Leenders

Patricius Aloysius Jacobus Tinnemans

Johannes Petrus Martinus Bernardus Vermeulen

Christian Wagner

Gerardus Hubertus Petrus Maria Swinkels

Wilhelmus Josephus Box

Kars Zeger Troost

Dominicus Jacobus Petrus Adrianus Franken

Edwin Johan Buis

Ruud Antonius Catharina Maria Beerens

Antonius Theodorus Wilhelmus Kempen

Robert Gabriël Maria Lansbergen

Jan Frederik Hoogkamp

Alexander Matthijs Struycken

Aschwin Lodewijk Hendricus Johannes Van Meer

Sebastiaan Maria Johannes Cornelissen

Raimond Visser

Lambertus Gerardus Maria Kessels

Sander Kerssemakers

John Tom Stewart, Iv

Patrick Johannes Cornelus Hendrik Smulders

Jan Van Elp

Martinus Hendricus Hendricus Hoeks

Ivo Vanderhallen

Franciscus Andreas Cornelis Johannes Spanjers

Jacob Kleijn

Rui Miguel Duarte Rodrigues Nunes

Johannes Charles Adrianus Van Den Berg

Henricus Johannes Adrianus Van De Sande

Gerardus Swinkels

Thijs Vervoort

Arno Jano Bleeker

Rui Miguel Duarte Rodreigues Nunes

Rui Miguel Duarte Rodriges Nunes

Antonius Kempen

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

A vessel () for an EUV radiation source, the vessel comprising a first opening () for accessing an interior () of the vessel, a first access member () configured to allow or prevent access to the interior of the vessel through the first opening, a second opening () for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member () arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

Vessel for a radiation source

A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

Optical element mount for lithographic apparatus

A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.

Radiation source

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Lithographic support structure

A transporter is provided for moving a substrate and a patterning device relative to one another in a lithographic apparatus. The transporter includes a beam, a driver, and a slide. The slide is supported by the beam, and the driver is disposed to move the slide relative to the beam in a transport direction. The beam has a concave interior surface transverse to the transport direction, and the slide is supported against the concave interior surface in at least two directions transverse to the transport direction.

Lithographic apparatus and device manufacturing method

A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.

Growing community of inventors

Eindhoven, Netherlands

Henricus Gerardus Tegenbosch