Carl Zeiss Smt Gmbh

Henner Baitinger

Markus Deguenther

Michael Patra

Markus Hauf

Willi Heintel

Paul Buettner

Viktor Schulga

Maximilian Schwenk

An arrangement of a microlithographic imaging device includes a first component, a second component and a connection unit of a connection device. The connection unit is configured to cooperate with the first component in a connection region between the first and second components. The connection unit is configured to cooperate, in a mounted state, with a tensioning unit of the connection device in a tensioning direction. The tensioning unit cooperates with the second component to connect the first and second component to one another in the connection region. The connection unit includes a main body. The insert is inserted in a receiving cutout in the main body and connected to the main body to transfer forces in the tensioning direction. The insert is configured to cooperate with the tensioning unit to connect the first and second components to one another in the connection region.

Connecting components of an optical imaging device

An optical component for a projection exposure apparatus includes a multiplicity of variably positionable beam-guiding elements which serve as pupil facets. The optical component can be arranged in the beam path of the projection optical unit.

Optical component

A support device for an optical apparatus is disclosed. The support device includes first and second support elements. The support device also includes first and second flexure bearings. The first flexure bearing and the second flexure bearing each connect the first support element and the second support element to one another in a thermally conductive manner and hold the first support element in a manner movable in at least one first direction relative to the second support element. Spring forces generated by the first flexure bearing and the second flexure bearing partly or completely cancel one another out in the case of a movement of the first support element relative to the second support element in the first direction.

Support apparatus for an optical device, optical device and lithography system

Growing community of inventors

Aalen, Germany

Henner Baitinger