Taiwan Semiconductor Manufacturing Comp. Ltd.

Auo Corporation

Heng-Yi Tseng

Kun-Cheng Tien

Yung-Long Chen

Chi-Tung Lai

Fang-Pin Chiang

Chieh-Jan Huang

Yung-Ching Chen

Guey-Shyung Cho

Chun-Feng Hsu

Maw-Sheng Juang

Chang-Ray Chen

Kuei-Chang Ho

Yi-Jyun Ke

Chin-Hsing Su

Yi-Han Tseng

A method for driving a cholesteric liquid crystal display, wherein the method includes steps as follows: Firstly, a reflective cholesteric liquid crystal panel including a pixel array composed of a plurality of pixel units is provided. Next, a scanning operation is performed on the pixel array. The scanning operation includes steps as follows: A continuous fixed pulse is applied to at least one of the plurality of pixel units lasting for a time period, so as to make a cholesterol liquid crystal layer of the at least one of the plurality of pixel units having a uniform lying helix (ULH) phase; and a maintaining pulse that is smaller than the continuous fixed pulse is applied to the at least one of the plurality of pixel units.

Cholesterol liquid crystal display and driving method thereof

A liquid supply system is provided. The liquid supply system includes a liquid tank configured to store a liquid. The liquid supply system also includes a liquid measurement module positioned outside the liquid tank and fluidly connected two connecting ports that are located at opposite sides of a surface of the liquid stored in the liquid tank. The liquid tank includes a tube extends parallel to a height direction of the liquid tank. The liquid tank also includes a floating member located in the tube and configured to float on the liquid. The liquid tank further includes a detection member configured to emit a detection signal toward the floating member.

Liquid supply system and liquid preparation method

A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.

Gas-supply system and method

A vertical furnace equipped with self-positioning gas injectors for processing wafers and a method for mounting self-positioning gas injectors in the furnace are disclosed. The vertical furnace is constructed by a cylindrical-shaped tube fabricated of quartz having a cavity therein for positioning of a wafer boat; a mounting ring positioning inside the cavity and for mounting the gas injectors thereon; and a plurality of gas injectors each formed in a &ldquo;L&rdquo; configuration with a stopper formed on a bottom of the horizontal portions of the gas injectors such that each of the stoppers is formed at a different location and fits only one slot opening formed on the mounting ring.

Apparatus and method for positioning gas injectors in a vertical furnace

A wafer boat for securely holding wafers therein during processing in a vertical furnace and a method for loading dummy wafers into a wafer boat without having to remove/reload for each oxidation process have been disclosed. In the wafer boat, a plurality of cavities are formed by horizontal notches in support posts together with horizontal ridges that are integrally formed with the support posts. A raised portion extending upwardly from a top surface of the horizontal ridge such that any possible outward movements of the dummy wafer, even after repeated loading/unloading operations, from the cavity can be prevented. A suitable height of the raised portion is between about 0.2 mm and about 2 mm, a more preferred range for the height is between about 0.2 mm and about 0.5 mm.

Wafer boat having improved wafer holding capability

An apparatus and a method for evacuating a process chamber by a dry pump and then shutting down the pump without back steam and high pressure safety problems are disclosed. In the apparatus, a conduit is provided for connecting in fluid communication between a process chamber and a dry pump, two gate valves are provided in the conduit with one mounted adjacent to the process chamber and the other adjacent to the dry pump. A pressure relief valve is provided and mounted to bridge over an inlet and an outlet of the second gate valve such that any pressure build-up in the conduit upstream of the second gate valve can be avoided for preventing injury to a machine operator. The back steam problem can be effectively prevented when the dry pump is shut down simultaneously with the closing of the first and the second gate valves. The pressure relief valve may be pre-set to operate automatically when a differential pressure larger than 0.33 psi is detected. The apparatus is further provided with a manual venting valve installed in the section of the conduit between the two gate valves such that the conduit may be manually vented to the atmosphere when the pressure relief valve malfunctions and fails to automatically vent.

Growing community of inventors

Hsin-Chu, Taiwan

Heng-Yi Tseng