Asml Netherlands B.v.

Heinmade B.v.

Hendrikus Johannes Schellens

Adrianus Marinus Wouter Heeren

Bo Lenssen

Erik Henricus Egidius Catharina Eummelen

Rogier Hendrikus Magdalena Cortie

Koen Cuypers

Stef Marten Johan Janssens

Sudhir Srivastava

Theodorus Johannes Antonius Renckens

Hans Butler

Theodorus Petrus Maria Cadee

Jan Van Eijk

Ruud Antonius Catharina Maria Beerens

Jeroen Gerard Gosen

Johannes Antonius Gerardus Akkermans

Richard Henricus Adrianus Van Lieshout

Sander Christiaan Broers

Pieter Johannes Gertrudis Meijers

Jeroen Johannes Theodorus Hendrikus De Best

George Alois Leonie Leenknegt

Peter Van Der Krieken

A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus

A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

Sensor, object positioning system, lithographic apparatus and device manufacturing method

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system is mounted on a reference structure of the lithographic apparatus by a mount of the lithographic apparatus. The mount includes a first piezoelectric element to exert a force on the projection system, a second piezoelectric element to measure the force, and an interconnection member interposed between the first and second piezoelectric elements, the interconnection member comprising a cut.

Active mount, lithographic apparatus comprising such active mount and method for tuning such active mount

Growing community of inventors

Bergeijk, Netherlands

Hendrikus Johannes Schellens