Asml Netherlands B.v.

Hendrikus Johannes Marinus Van Abeelen

Martijn Houben

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Sander Catharina Reinier Derks

Armand Rosa Jozef Dassen

Joost Jeroen Ottens

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Andre Bernardus Jeunink

Frits Van Der Meulen

Marcus Martinus Petrus Adrianus Vermeulen

Rene Theodorus Petrus Compen

Peter Smits

Marco Adrianus Peter Van Den Heuvel

Anko Jozef Cornelus Sijben

Wouterus Johannes Petrus Maria Maas

Alwin De Kock

Henricus Petrus Versteijnen

Paula Steffens

Antonius Arnoldus Meulendijks

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

Lithographic apparatus and method

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Moergestel, Netherlands

Hendrikus Johannes Marinus Van Abeelen