Asml Netherlands B.v.

Hendrikus Herman Marie Cox

Frits Van Der Meulen

Marc Wilhelmus Maria Van Der Wijst

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Martinus Van Duijnhoven

Jacobus Cornelis Gerardus Van Der Sanden

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Arie Jeffrey Den Boef

Christiaan Alexander Hoogendam

Hans Butler

Nicolaas Rudolf Kemper

Raymond Wilhelmus Louis Lafarre

Harmen Klaas Van Der Schoot

Frank Johannes Jacobus Van Boxtel

Dominicus Jacobus Petrus Adrianus Franken

David Ferdinand Vles

Gosse Charles De Vries

Wilhelmus Franciscus Johannes Simons

Sander Catharina Reinier Derks

Maurice Willem Jozef Etiënne Wijckmans

Martinus Agnes Willem Cuijpers

Willem Herman Gertruda Anna Koenen

Günes Nakiboglu

Mark Constant Johannes Baggen

Ramidin Izair Kamidi

Frank Auer

Koos Van Berkel

Christiaan Louis Valentin

Sander Kerssemakers

Paul Corné Henri De Wit

Robertus Mathijs Gerardus Rijs

Olof Martinus Josephus Fischer

Alain Louis Claude Leroux

Stan Henricus Van Der Meulen

Thijs Adriaan Cornelis Van Keulen

Dries Vaast Paul Hemschoote

Dave Braaksma

Erik Johan Arlemark

Bart Friso Riedstra

Gerard Johannes Boogaard

Bastiaan Stephanus Hendrikus Jansen

René Wilhelmus Antonius Hubertus Leenaars

Stephan Christiaan Quintus Libourel

Joost De Hoogh

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Erwin Antonius Henricus Franciscus Van Den Boogaert

Jessica Henrica Anna Verdonschot

A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.

Method of controlling a position of a first object relative to a second object, control unit, lithographic apparatus and apparatus

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

An electromagnetic actuator is described the actuator comprising:

Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.

Stage system, lithographic apparatus and device manufacturing method

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber () in communication with the compartment and a perforated plate (), having a plurality of through-holes (), between the chamber and the compartment.

A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.

Growing community of inventors

Eindhoven, Netherlands

Hendrikus Herman Marie Cox