Asml Netherlands B.v.

Asml Holding N.v.

Hendrikus Gijsbertus Schimmel

Dzmitry Labetski

Gerardus Hubertus Petrus Maria Swinkels

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Jan Bernard Plechelmus Van Schoot

Tjarko Adriaan Rudolf Van Empel

Michel Riepen

Yuri Johannes Gabriël Van De Vijver

Johannes Hubertus Josephina Moors

Reinier Theodorus Martinus Jilisen

Jacob Brinkert

Nicolaas Ten Kate

Hans Jansen

Johan Frederik Dijksman

Johannes Christiaan Leonardus Franken

Vladimir Vitalevich Ivanov

Ramin Badie

Henricus Jozef Castelijns

Wilbert Jan Mestrom

Albert Pieter Rijpma

Peter Van Putten

Dennis Jozef Maria Paulussen

Wim Ronald Kampinga

Gerrit Van Der Straaten

Jan Okke Nieuwenkamp

Brian Vernon Virgo

Maarten Marinus Johannes Wilhelmus Van Herpen

Derk Jan Wilfred Klunder

Martinus Cornelis Maria Verhagen

Richard Joseph Bruls

Andrei Mikhailovich Yakunin

Han-Kwang Nienhuys

Wilhelmus Josephus Box

Pieter-Jan Van Zwol

Yang-Shan Huang

Olav Waldemar Vladimir Frijns

Vladimir Mihailovitch Krivtsun

Dennis De Graaf

Jeroen Huijbregtse

Maarten Van Kampen

Antonie Hendrik Verweij

Marc Antonius Maria Haast

Ronald Peter Albright

Peter Gerardus Jonkers

Kerim Nadir

Viacheslav Medvedev

Cristian Bogdan Craus

Niels Machiel Driessen

Sander Baltussen

Christian Felix Wählisch

Wendelin Johanna Maria Versteeg

Chuangxin Zhao

Jan Groenewold

Pär Mårten Lukas Broman

Yuri Johannes Gabrial Van De Vijver

Hans Johannes Maria Freriks

Karel Joop Bosschaart

Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

Particle traps and barriers for particle suppression

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device () arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material () arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.

Radiation system and optical device

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma () generated from a fuel () within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((), ()). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces () by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Radiation source and method for lithography

A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.

Fuel stream generator, source collector apparatus and lithographic apparatus

A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.

Source-collector device, lithographic apparatus, and device manufacturing method

A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Module and method for producing extreme ultraviolet radiation

Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.

A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.

Radiation source

A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

Lithographic apparatus and device manufacturing method

The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

Method and system for determining a suppression factor of a suppression system and a lithographic apparatus

A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.

Radiation source, lithographic apparatus and device manufacturing method

Growing community of inventors

Utrecht, Netherlands

Hendrikus Gijsbertus Schimmel