Asml Netherlands B.v.

Hendrikus Alphonsus Ludovicus Van Dijck

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Martinus Hendrikus Antonius Leenders

Johannes Hubertus Josephina Moors

Johannes Henricus Wilhelmus Jacobs

Jan Steven Christiaan Westerlaken

Fei Liu

Antonius Theodorus Wilhelmus Kempen

Andrew David LaForge

Yue Ma

William Peter Van Drent

Klaus Martin Hummler

Alexey Sergeevich Kuznetsov

Peter Gerardus Jonkers

Hubertus Johannes Van De Wiel

Parham Yaghoobi

Jeroen Hubert Rommers

Rui Miguel Duarte Rodrigues Nunes

Qiushi Zhu

Fernando Brizuela

Rob Carlo Wieggers

Umesh Prasad Gomes

Elena Nedanovska

Celal Korkmaz

Alexander Downn Kim

Christian Wagner

Richard Joseph Bruls

Tammo Uitterdijk

Laurentius Catrinus Jorritsma

Gerardus Carolus Johannus Hofmans

Orlando Serapio Cicilia

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.

Lithographic apparatus and device manufacturing method

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Veldhoven, Netherlands

Hendrikus Alphonsus Ludovicus Van Dijck