Advanced Energy Industries, Inc.

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Kla Tencor Corporation

Aes Global Holdings Pte Ltd.

Hendrik Walde

David J Christie

Kenneth W Finley

Daryl Frost

Brian D Kowal

Klaus Goedicke

Leonard Joseph Mahoney

Peter Frach

Carl William Almgren

Gregory A Roche

Ken Nauman

Joshua Brian Pankratz

Bruce Fries

William W Saylor

William D Sproul

Volker Kirchhoff

Torsten Winkler

Jonathan Reschke

Skip B Larson

Kenneth E Nauman, Jr

Doug Pelleymounter

R Mike McDonald

Forrest Morgan

Frank Heine

Christian Gottfried

David Christie

Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load.

Arc management with voltage reversal and improved recovery

This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

An apparatus and methods for plasma-based sputtering deposition using a direct current power supply is disclosed. In one embodiment, a plasma is generated by connecting a plurality of electrodes to a supply of current, and a polarity of voltage applied to each of a plurality of electrodes in the processing chamber is periodically reversed so that at least one of the electrodes sputters material on to the substrate. And an amount of power that is applied to at least one of the plurality of electrodes is modulated so as to deposit the material on the stationary substrate with a desired characteristic. In some embodiments, the substrate is statically disposed in the chamber during processing. And many embodiments utilize feedback indicative of the state of the deposition to modulate the amount of power applied to one or more electrodes.

Methods and apparatus for sputtering using direct current

Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal.

Power converter with preemptive protection

Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval.

Proactive arc management of a plasma load

A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

Sensor array for measuring plasma characteristics in plasma processing environments

Preemptive protection for a power convertor

Methods and apparatus for sputtering deposition using direct current

One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.

Power supply ignition system and method

Among many embodiments, a power converter and a method for operating a power converter are disclosed. The power converter may include a pair of switches connected in series, an output transformer connected to a common node between the switches and a protection apparatus for protecting each switch from being hard driven, each switch being enabled by a gate signal and turning ON in alternating half cycles so as to drive transformer current in alternate directions through the transformer. The protection apparatus may include: a detector configured to detect whether an intrinsic diode in a first switch is conducting the transformer current; and a gate signal disabler configured in response to the detector blocking an ON gate pulse from reaching a second switch in the pair of switches so that the second switch is not turned ON while the intrinsic diode of the first switch is conducting.

Protection method, system and apparatus for a power converter

This invention teaches an arc detection and arc reduction circuit for use with power supplies for delivering power to a plasma processing system that utilizes a resonant circuit that stores energy and when the voltage drops between the cathode and anode of the processing chamber the stored energy generates a current in a current transformer in response to the voltage change to switch a magnetically coupled inductor in parallel with the cathode and anode causing a reversal of the voltage that reduces arcs in the plasma chamber. In an alternate embodiment the magnetically coupled inductor is replaced by a pulse transformer and the pulse transformer is placed in parallel with the cathode and anode causing a reversal of the voltage that reduces arcs in the plasma chamber.

Stored energy arc detection and arc reduction circuit

Growing community of inventors

Fort Collins, CO, United States of America

Hendrik Walde