Promerus, Lcc

Merck Patent Gmbh

Sumitomo Bakelite Company Limited

Hendra Ng

Wei Zhang

Andrew Bell

Edmund Elce

Larry Funderburk Rhodes

Brian F Knapp

Pramod Kandanarachchi

Robert A Shick

Sridevi Kaiti

Pawel Miskiewicz

Kazuyoshi Fujita

Toby Cull

Christopher Apanius

Cheryl Burns

Steven J Smith

Xiaoming Wu

Keitaro Seto

Chris Apanius

Phil Neal

Miguel Carrasco-Orozco

David Christoph Müller

Piotr Wierzchowiec

David Christoph Mueller

Royce Groff

Crystal D Cyrus

Rajesh Raja Puthenkovilakom

Linda Zhang

Seishi Ohashi

Brian Kocher

Yogesh Patel

Masanobu Sakamoto

Takashi Hirano

Saikumar Jayaraman

Haruo Ikeda

Ramakrishna Ravikiran

Dino Amoroso

Etsu Takeuchi

Osamu Onishi

Junya Kusunoki

Phillip S Neal

William DiMenna

Chad Brick

Paul Evans

Jianyong Jin

Matthew Apanius

Ramakrisha Ravikiran

Steven Smith

Paul J Evans

Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

Photoimageable polyolefin compositions containing photobase generators

Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions containing photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Photoimageable compositions containing photobase generators

The present invention relates to use of certain chain transfer agents to control molecular weight of addition mass polymerization of certain polycycloolefinic monomers. More specifically, the present invention relates to use of a series of substituted bicycloalkenes as chain transfer agents in the addition mass polymerization of a series of functionalized norbornene-type monomers. This invention also relates to compositions containing bicycloalkenes as chain transfer agents in forming 'in mold' polycycloolefinic polymers by addition mass polymerization.

Chain transfer agent for addition mass polymerization of polycycloolefinic monomers

The present invention relates to certain ring open metathesis polymerized (ROMP) polymers encompassing polycycloolefinic monomers and a certain of olefinic monomers having thermally labile functional group. More specifically, the present invention relates to ROMP polymers under mass polymerization conditions of a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like. This invention also relates to reaction compositions containing a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like, which undergo ring open metathesis polymerization to produce materials which are useful as flame retardant materials having a variety of applications.

Flame retardant romp polycycloolefinic polymers

The present invention relates to certain vinyl addition polymers encompassing polycycloolefinic monomers and a certain of olefinic monomers having thermally labile functional group. More specifically, the present invention relates to vinyl addition polymers under mass polymerization conditions of a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like. This invention also relates to reaction compositions containing a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like, which undergo vinyl addition polymerization to produce materials which are useful as flame retardant materials having a variety of applications.

Flame retardant vinyl addition polycycloolefinic polymers

Embodiments in accordance with the present invention encompass positive-tone, aqueous developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Photoimageable compositions containing thermal base generators

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

Gate insulator layer for organic electronic devices

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

Interlayer for electronic devices

Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Photoimageable compositions containing oxetane functionality

The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized and an additive package containing a phenolic antioxidant and a diaryl amine synergist, and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.

Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof

The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized and an additive package containing a phenolic antioxidant and a synergist, and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.

Materials, and methods that use such materials, that are useful for forming chip stacks, chip and wafer bonding and wafer thinning are disclosed. Such methods and materials provide strong bonds while also being readily removed with little or no residues.

Methods and materials useful for chip stacking, chip and wafer bonding

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Highland Heights, OH, United States of America

Hendra Ng