H.c. Starck Gmbh

H. C. Starck, Gmbh & Co Kg

Taniobis Gmbh

H.c. Starck Tantalum and Niobium Gmbh

Helmut Haas

Christoph Schnitter

Ulrich Bartmann

Marcel Hagymasi

Nobuyuki Sato

Holger Brumm

Tadashi Komeya

Paul R Aimone

Patrick Hogan

Markus Weinmann

Christine Rawohl

Timo Langetepe

Elisabeth Droste

Melanie Stenzel

Andreas Scharf

Joseph Flanigan

Kamil Paul Rataj

Elisabeth Gorman

Ullrich Bartmann

A method for producing an electrical component via a 3D printing includes preparing a first layer which includes a valve metal powder, consolidating at least a portion of the valve metal powder of the first layer via a first selective irradiation with a laser, applying a second layer which includes the valve metal powder to the first layer, consolidating at least a portion of the valve metal powder of the second layer via a second selective irradiation with the laser so as to form a composite of the first layer and of the second layer, applying respective additional layers which include the valve metal powder to the composite, and consolidating at least a portion of the valve metal powder of the respective additional layers via a respective additional selective irradiation with the laser to thereby obtain the electrical component.

Method for producing electronic components by means of 3D printing

The present invention relates to a process for the deoxidation of valve metal primary powders by means of reducing metals and/or metal hydrides, and a process for the production of tantalum powders that are suitable as anode material for electrolytic capacitors.

Method for the production of valve metal powders

A method for making a sputtering target including steps of encapsulating and hot isostatically pressing at least one mass of metal powder (e.g., tantalum), having a particle size ranging from about 10 to about 1000 &#x3bc;m, with at least about 10 percent by weight of particles having a particle size greater than about 150 &#x3bc;m (for example, about 29 to about 56 percent (e.g., about 35 to about 47 percent) by weight of the particles in the at least one mass of metal powder having a particle size that is larger than 150 microns, but below about 250 &#x3bc;m), for defining at least a portion of a sputtering target body, having an essentially theoretical random and substantially uniform crystallographic texture.

High purity refractory metal powders and their use in sputtering targets which may have random texture

A process for producing an anode for an electrolytic capacitor includes pressing a tantalum powder around a tantalum wire, a tantalum ribbon, or a tantalum sheet to form a pressed body. The pressed body is sintered to form a porous sintered body. The porous sintered body is cooled to form a cooled porous sintered body. The cooled porous sintered body is treated with at least one oxidant comprising at least one of a gaseous oxidant and a liquid oxidant to form a treated sintered body. The treated sintered body is anodically oxidized in an electrolyte to form a dielectric layer.

Method for producing electrolytic capacitors from valve metal powders

The invention comprises semifinished products with a structured surface, the semifinished product comprising an oxidized and subsequently re-reduced surface containing at least one refractory metal, and also a process for their production and their use for producing high-capacitance components.

Semifinished products with a structured sinter-active surface and a process for their production

Process for the production of valve metal powders, in particular niobium and tantalum powder, by reduction of corresponding valve metal oxide powders by means of vaporous reducing metals and/or hydrides thereof, preferably in the presence of an inert carrier gas, wherein the reduction is performed at a vapor partial pressure of the reducing metal/metal hydride of 5 to 110 hPa and an overall pressure of less than 1000 hPa, and tantalum powder obtainable in this way having a high stability of the powder agglomerate particles.

Method for production of niobium and tantalum powder

A tantalum powder consisting of agglomerated primary particle with a minimum primary particle dimension of 0.2 to 0.8 &#x3bc;m, a specific surface area of 0.9 to 2.5 m/g and a particle size distribution determined to ASTM B 822 corresponding to a D10 value of 5 to 25 &#x3bc;m, a D50 value of 20 to 140 &#x3bc;m and a D90 value of 40 to 250 &#x3bc;m, wherein the powder does not comprise an effective content of sintering protection agents.

Tantalum powder for the production of solid electrolyte capacitors

Method for the production of niobium and tantalum powder

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Schladen-Beuchte, Germany

Helmut Haas