Siemens Aktiengesellschaft

Helmut Formanek

Erwin Knapek

Burkhard Lischke

Wolfgang Von Gentzkow

Hans-Dieter Feucht

Reinhard Weyl

Magdalena Hintermaier

Gerhard Wanner

A biosensor is prepared having a selective detection system containing a biochemical substance such as an enzyme immobilized on an olefinic-unsaturated, epoxyfunctional polysiloxane. Prior to immobilization of the biochemical substance, the polysiloxane is applied as a layer to a carrier and cross-linked by treatment with high-energy radiation. A biochemical substance is reacted with epoxy groups of the cross-linked polysiloxane. Any non-reacted epoxy groups are reacted with a compound containing an amino group, a carboxyl group or an amino group and a carboxyl group to stabilize. After cross-linking and before reacting of the biochemical substance, the cross-linked polysiloxane can be hydrophilized by reacting some of the epoxy groups with a hydrophilic compound containing a reactive group.

Biosensor containing a biochemical substance immobilized on a layer of

A method for producing smooth uniform polymethylmethacrylate (PMMA) layers having a thickness of greater than 20 .mu.m. The PMMA layers are produced utilizing a solution of polymethylmethacrylate in an ester of lactic acid. The PMMA layers are particularly suited for micro-structuring techniques which utilize high-energy, ionizing radiation. The PMMA layers exhibit a good adhesion to metallic, semi-conducting and insulating substrates.

Method for producing uniform polymethylmethacrylate layers

An electron-beam-sensitive resist material is provided that includes film having high-polymers and includes dopings. The material is made into a solution that is added to the substrate so that the resist material can be produced on the semiconductive or piezoelectric substrates by drying. The doping additives of the resist material can include: halogens, halogen compounds, peroxides, kaotropic salts and xanthates. The resist material is used for the production of electron-beam-written microstructures with high structural resolution and, in comparison to the known methods, eliminates the error-affected developing process.

Electron-beam-sensitive resist material for microstructures in

A method for the orientation of a liquid crystalline substance with respect to a substrate to which the substance is to be applied, the method comprising treating the surface of the substrate prior to application of the substance with a solution of at least one steroid, or at least one porphyrin dyestuff or both.

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Munich, Germany

Helmut Formanek