Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Shell Oil Comapny

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Johannes Catharinus Hubertus Mulkens

Erik Roelof Loopstra

Christiaan Alexander Hoogendam

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Sjoerd Nicolaas Lambertus Donders

Joeri Lof

Alexander Straaijer

Klaus Simon

Joannes Theodoor De Smit

Roelof Aeilko Siebrand Ritsema

Erik Theodorus Maria Bijlaart

Hans Butler

Timotheus Franciscus Sengers

Hendricus Johannes Maria Meijer

Frank Van Schaik

Hans Jansen

Antonius Theodorus Anna Maria Derksen

Johannes Jacobus Matheus Baselmans

Patricius Aloysius Jacobus Tinnemans

Yvonne Wendela Kruijt-Stegeman

Theodorus Marinus Modderman

Franciscus Johannes Herman Maria Teunissen

Felix Godfried Peter Peeters

Bernardus Antonius Slaghekke

Arie Jeffrey Den Boef

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Mark Kroon

Jacobus Hermanus Maria Neijzen

Peter Dirksen

Jacobus Johannus Leonardus Hendricus Verspay

Paulus Cornelis Duineveld

Hendrik Roelof Stapert

Johan George Kloosterboer

Emile Johannes Karel Verstegen

Wouter Roest

Aleksey Yurievich Kolensnychenko

Sander Frederik Wuister

Henrikus Herman Marie Cox

Johan Frederik Dijksman

Gerard E Van Rosmalen

Marco Betting

Willem Gerard Ophey

Matthijs Hendrik Keuper

Peter Wilkinson

Paulus Henricus Joannes Verbeek

Bart Prast

Henricus Wilhelmus Aloysius Janssen

Henricus Abraham Geers

Roelof Aeilko Siebranc Ritsema

Cornelius Johannes Schellekens

Emile Verstegen

For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

Method and device for irradiating spots on a layer

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Growing community of inventors

Amsterdam, Netherlands

Helmar Van Santen