Saint-gobain Vitrage

Saint-gobain Glass France

Heinz Schicht

Nicolas Nadaud

Uwe Schmidt

Herbert Schindler

Wilfried Kaiser

Lars Ihlo

Rolf Pfannkuchen

Bodo Hryniw

Pierre-Alain Gillet

Ralf Comtesse

Axel Marold

Wulf Haussler

Gerhard Ditzel

Werner Gregorowius

Klaus Januschkewitz

Reiner Leuteritz

A low-emissivity multilayer system highly resistant to heat treatment for transparent substrates, in particular for window panes comprises, starting from the substrate, at least a lower antireflection coating consisting of several partial layers and including a layer essentially consisting of ZnO which is adjacent with a silver-based functional layer, an essentially metallic blocking layer located on top of the silver-based layer, an upper antireflection coating consisting of several partial layers and a cover coating optionally consisting of several partial layers. The upper antireflection coating has: a partial layer of ZnO or a mixed oxide ZnMeOthat contains ZnO or a succession of layers of mixed oxides of the ZnO:Al/ZnMeOtype; a partial layer of SiNor SiON; and between these two partial layers, a separating layer with a thickness of 0.5 to 5 nm, consisting of a metal oxide or a mixed oxide with a cubic crystal lattice, which prevents direct contact between these two partial layers. Coated window panes that are highly resistant to technical handling operations comprising an inserted separating layer that makes it possible to further improve the mechanical and chemical properties of the multilayer system.

Highly heat-resistant low-emissivity multilayer system for transparent substrates

In a heat-resistant low-emissivity (low-E) multilayer system that includes a silver layer as functional layer, for transparent substrates, in particular for window panes, which has, between the surface of the substrate and the silver layer, a high-refringence layer, in particular made of TiO, NbOor TiNbO, and, immediately below the silver layer, a layer essentially consisting of ZnO, a mixed oxide layer with a thickness of at least 0.5 nm, made of NiCrOor InSnO(ITO) that serves as antiscattering layer is placed between the high-refringence layer and the ZnO layer.

Low emissivity (low-E) thin coating stacks with intermediate antidiffusion layers

A multilayer film, capable of withstanding high thermal stresses, with silver as functional layer, a sacrificial metal layer placed on top of the silver layer and antireflection dielectric layers, has a metal nitride layer between the silver layer and the sacrificial metal layer. This metal nitride layer is composed in particular of SiNand/or AlN and constitutes an effective diffusion barrier. The optical and energy properties of the silver layer consequently remain, for the most part, preserved, even after undergoing high thermal stresses (for example of the bending or toughening type when curving and/or prestressing a window pane provided with the multilayer film).

Prestressable low-E layer systems for window panes

A glass pane is provided with a multilayer system having metallic reflection and a high thermal resistance. The multilayer system comprises a dielectric base layer, a metal layer having a high reflection, made of chromium or a metal alloy containing at least 45 wt % chromium, and a nitride top layer. The dielectric base layer is composed of at least one oxide partial layer made of SnO, ZnO and/or TiO, close to the surface of the glass, and a nitride partial layer, close to the metal layer.

Transparent substrate having a stack of thin metallic reflection layers

A low-emissivity multilayer system, capable of being bent and prestressed, for glazing panes, with silver as functional layer, comprises a sacrificial metal layer of Ti or an alloy of Ti and Zn and/or Al placed above the silver layer, antireflection dielectric layers and an oxide, nitride or oxynitride covering layer. The sacrificial metal layer contains chemically bonded hydrogen. An optionally Al- and/or In-doped ZnO layer is adjacent to the sacrificial metal layer. The covering layer consists of a titanium compound. Multilayer systems of this type can be manufactured relatively inexpensively and have a high hardness and a high chemical resistance. Their color parameters are very reproducible, even in the case of a heat treatment at high temperature.

Prestressable layer system for partition glass

A layer stack for the surface coating of transparent substrates, in particular panes of glass, has at least one metal oxide composite layer produced by reactive cathodic sputtering and contains Zn oxide and Sn oxide. Relative to the total amount of metal, this metal oxide composite layer contains from 0.5 to 6.5% by weight of one or more of the elements Al, Ga, In, B, Y, La, Ge, Si, P, As, Sb, Bi, Ce, Ti, Zr, Nb and Ta. In a layer stack which has a silver layer as a functional layer, the metal oxide composite layer may be used as an upper and/or lower antireflection layer, as a diffusion barrier layer, as a sublayer of an antireflection layer and/or as an upper cover layer.

Layer stack for transparent substrates

Layered stack for transparent substrates

The invention is a transparent substrate provided with a multilayer stack having thermal properties, especially solar-control or low-emissivity properties. The stack comprises at least one silver-based functional layer surrounded by at least two coatings made of dielectric material, with the presence of thin metal layers between the functional layer and at least one of the coatings made of dielectric material. A preferred stack is D /ZnO/Ag/AlM/D /ZnM&prime;O, with AlM representing an aluminum alloy, ZnM&prime;O a mixed oxide of zinc and at least one other metal, with D and D being a layer or a superposition of layers comprising at least one layer made of a metal oxide, silicon nitride, metal nitride or made of a mixed silicon/metal nitride.

Glazing provided with a low-emissivity multilayer stack

A thin multilayer coating having reflection properties in the infrared and/or in the solar radiation range of the low-emissivity type for windows comprises a lower dielectric antireflection treatment layer, at least one silver-based functional layer, at least one metallic protection layer adjacent to the silver layer and an upper dielectric antireflection treatment layer. The upper dielectric antireflection treatment layer comprises a lower partial layer made of SnO,, ZnO, TiO,, Bi,O,or Al,O,and an upper partial layer made of a mixed oxide based on zinc and aluminium, especially one having a spinel structure of the ZnAl,O,type.

Transparent substrate provided with thin layers having reflection properties in the infrared

The invention concerns a transparent substrate provided with a thin-film stack comprising at least one metallic film with reflective properties in the infrared, under which is disposed a first antireflection coating consisting essentially of one or more metal oxides, and an upper protective metallic film characterized in that the protective metallic film consists of an alloy of Ti, Zr or Hf with Al, Pt or Pd or an AlSi alloy. According to the invention, the second upper antireflection coating includes at least two metal oxide films, one of which is ZnO based and contains 0.1 to 10% by weight of at least one of the elements B, Si, Ga, Sm, Al, Co, Mg, Mn, Fe, Ni and/or Cr and the other is SnO.sub.2 or Bi.sub.2 O.sub.3 based, and a final, hard oxide based film.

Glass substrate provided with a thin-film stack having reflective

The invention relates to a transparent substrate, in particular glass substrate, provided with a thin-film stack including at least one metal film with properties in the infrared, in particular a low-emissivity one, arranged between two coatings which each include at least one anti-reflection film based on dielectric material, and at least one protective film based on a sacrificial metal or a partially or fully oxidized sacrificial metal or a sacrificial metal alloy placed between the said metal film and one of the said coatings. According to the invention, the film placed directly below and/or above the said metal film contains at least one of the noble metals Pd, Au, Ir, Pt and Rh. The low-level addition of one or more of these metals to the others, namely the film placed below and/or above the metal film, leads to an increase in the chemical stability and the hardness of the thin-film stack.

Transparent substrate provided with a thin-film stack with properties in

A method for improving the quality of a system of layers deposited on a substrate such as glass is provided, in which, the system of layers have an oxide-based surface layer, in particular n-type semi-conductor oxides such as SnO.sub.x, in which the surface layer is subjected to IR irradiation to provide a stabilization of the layer equivalent to or better than with a 48-hour exposure to the air.

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Bethau, Germany

Heinz Schicht