International Business Machines Corporation

Heinz P Meier

Christoph S Harder

Abbas Behfar-Rad

Heinz Jaeckel

Fritz R Gfeller

William P Risk, Iii

Wilfried Lenth

Alfred Phillips, Jr

Stefan Hausser

Sridhar V Iyer

Edward A Van Gieson

Willi Walter

A planar, topology free, semiconductor quantum-well laser is described. The quantum-well active layer is formed and patterned in a specified region which is constrained on all sides by high bandgaps which are formed through the use of impurity-free diffusion techniques. After the impurity-free diffusion has taken place, an upper portion is then epitaxially deposited to complete the structure. High-power, single fundamental mode laser operation is achieved by funneling current into the constrained quantum-well active region, high bandgap regions in conjunction with low index of refraction in regions surrounding the active area. The structure is further designed to allow low beam divergence in the direction perpendicular to the semiconductor laser junction.

Semiconductor laser with low vertical far-field

Planar, topology-free, single-mode, high-power semiconductor

Laser diode with independent electronic and optical confinement, referred to as decoupled confinement, comprising an active region, i.e. an active layer, a single quantum well layer or a multi-quantum well layer, embedded in a carrier confinement structure providing for an energy barrier at least on one side of the active region. This energy barrier reduces carrier leakage out of the active region. The carrier confinement structure is embedded in an optical confinement structure which guides the optical light wave. The inventive laser diode is characterized in that the height of the energy barrier confining the carriers, and the refractive index step providing for optical waveguiding of the light wave are decoupled.

Decoupled optic and electronic confinement laser diode

A semiconductor ridge waveguide laser having a high value of horizontal far-field wherein the laser structure includes a substrate, a first or lower cladding layer composed of a AlGaAs on the substrate, an acting layer on the lower cladding layer, and a second or upper cladding layer composed of AlGaAs on the active layer. The upper cladding layer includes a raised ridge portion formed by etching the upper cladding layer through a mask. A contact layer is disposed on top of the ridge portion. The aluminum mole concentration of the lower cladding layer is greater than the aluminum mole concentration of the upper cladding layer. This forces the optical mode towards the upper cladding layer and results in an increased lateral waveguide confinement that produces a high horizontal far-field.

Semiconductor ridge waveguide laser with asymmetrical cladding

A semiconductor laser diode comprises a waveguide formed by an active layer sandwiched in between upper and lower cladding layers, wherein the cladding layers comprise a material having a bandgap that differs from that of the active layer. The waveguide is deposited on a structured substrate having a surface pattern that causes the waveguide to be bent near its ends, i.e., near cleaved or etched facets of the completed laser device thereby providing a non-absorbing mirror (NAM) window structure. A laser beam, generated in the center, planar waveguide section, leaves the waveguide at the bend, continuing substantially unabsorbed and undeflected through the wider bandgap cladding layer material towards the mirror facet. An amphoteric dopant, used during growth of the layered waveguide structure, causes a reversal of the conductivity-type within the semiconductor material deposited above inclined surface regions. Thus, a junction serving as current block is formed preventing lateral currents from reaching the facet region.

Semiconductor laser diode deposited on a structured substrate surface

The process is particularly useful in the fabrication of GaAs quantum well (QW) laser diodes. Starting point is a ridge-patterned (100)-substrate (21), the crystal orientation of the sidewalls, e.g., (411A)-oriented, being different from that of the horizontal top. The sidewall facets thus have a lower Ga incorporation rate. In a molecular beam epitaxy (MBE) system, the lower AlGaAs cladding layer (22) is first grown, followed by the high-temperature growth of the active GaAs QW (23). Due to diffusion and desorption processes, the GaAs thickness at the sidewalls is smaller than on the horizontal top of the ridge. During a short growth interrupt, the GaAs completely desorbs from the sidewall facets. With the subsequent growth of the upper cladding layer (24), the QW becomes laterally embedded in higher bandgap material providing for lateral electric confinement.

Process for the selective growth of GaAs

Apparatus and method for producing coherent blue-green-light radiation having a wavelength of essentially 490-500 nm. A diode laser, such as a strained-layer InGaAs/GaAs diode laser, provides a 980-1,000 nm beam, and a nonlinear crystal of KTP produces coherent radiation by noncritically phase-matched second-harmonic generation (SHG) of said beam. The beam preferably has a wavelength of essentially 994 nm for generating radiation having a wavelength of essentially 497 nm. The crystal is disposed within an optical resonator and the frequency of the laser is locked to that of the resonator. Alternatively, two diode lasers are oriented to provide orthogonally polarized beams each with a wavelength of 980-1,000 nm but within essentially 1 nm of each other, and the KTP crystal is oriented with its a- and c-axis parallel to the orthogonally polarized beams. The KTP crystal may have an associated optical waveguide along which the beam is propagated to enhance SHG efficiency.

Miniature blue-green laser source using second-harmonic generation

A GaAs/AlGaAs-transverse junction stripe (TJS) laser with p-n junction formation by crystal plane dependent doping is described. The laser structure includes a molecular beam epitaxy (MBE)-deposited hetero-structure comprising AlGaAs layers with an active GaAs layer sandwiched therebetween. These layers are grown on the patterned surface of a GaAs substrate which provides (100)-plane oriented planar ridges and grooves, the edges being (111A)-plane oriented. p-n homojunctions are formed in the GaAs layer at the intersections of the (111A) and (100) crystal planes. Ohmic contacts are provided for applying currents of at least the threshold level of the junctions. These TJS lasers can be used to form 1- or 2-dimensional arrays of phase-coupled lasers for providing high optical power output.

Growing community of inventors

Thalwil, Switzerland

Heinz P Meier