Olin Microelectronic Chemicals, Inc.

Ciba-geigy Corporation

Ciba Specialty Chemicals Corporation

Ocg Microelectronic Materials, Inc.

Heinz Holzwarth

Reinhard Schulz

Stephan Ilg

Carl-Lorenz Mertesdorf

Hans-Thomas Schacht

Norbert Muenzel

Pasquale Alfred Falcigno

Norbert Munzel

Hans-Jorg Kirner

Ottmar Rohde, Deceased

Eric Tinguely

Christoph De Leo

Norbert M Unzel

Ulrich Sch Adeli

Radiation-sensitive compositions comprising a substance which forms acid under the action of actinic radiation and polymers based on combination of different repeating units derived from hydroxy styrene and hydroxy-vinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

Crosslinked polymers

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent;

High resolution i-line photoresist of high sensitivity

Polymers based on combination of different repeating units derived from hydroxy styrene and hydroxyvinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;

The invention relates to novel maleimide copolymers which, in addition to structural units derived from certain maleimide derivatives defined more precisely in the present patent application, comprises recurring structural units selected from the structural units of the formulae (Ia) and (Ib) ##STR1## where A is a direct single bond or a divalent group of the formula --O--;

Photoresist compositions containing copolymers having acid-labile groups

Growing community of inventors

Bad Krozingen, Germany

Heinz Holzwarth