Steag Ast

Steag Rtp Systems Gmbh

Ast Elektronik Gmbh

Torqeedo Gmbh

Steag Ast Elektronik Gmbh

Heinrich Walk

Thomas Knarr

Markus Hauf

Zsolt Nenyei

Werner Blersch

Michael Maurer

Horst Balthasar

Uwe M&uuml;ller

Friedrich Boebel

Klaus Kraft

Thomas Theiler

Andreas Tillmann

Helmut Merkle

Peter Gruenwald

Roland Mader

Friedrich Böbel

A transportable outboard drive for a boat has a head, a pylon, a shaft connecting the head and the pylon, an electric motor and a cable running inside the shaft. The shaft has at least two shaft sections and wherein the head, shaft and pylon can be arranged in a working configuration or in a transport configuration. In the working configuration, the head, the shaft and the pylon are rigidly connected to each other. In the working configuration and the transport configuration, the cable and shaft are differently positioned with respect to each other, whereas, in its transport configuration, the shaft sections are separated from each other.

Transportable outboard motor

The aim of the invention is to provide an economical and homogenous thermal treatment for substrate. To this end, the inventive device and method for thermally treating substrates, especially semiconductor wafers, comprise at least one heating device for heating at least one substrate by electromagnetic radiation. Said heating device comprises at least two arc lamps, the radiation characteristics for each arc lamp being controlled individually, and the electromagnetic radiation of the arc lamps contributing essentially to the power density of the electromagnetic radiation of the heating device.

Device and method for thermally treating substrates

A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic pyrometer. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.

Method of measuring electromagnetic radiation

An apparatus for the thermal treatment of substrates is provided. The apparatus includes a reaction chamber, at least one elongated heat source, and at least one reflection wall that is disposed adjacent to the heat source and serves to reflect at least a portion of the radiation given off thereby. The reflection wall has at least one rib, and the heat source is disposed at an oblique angle to the longitudinal direction of the rib.

Apparatus for the thermal treatment of substrates

A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic parameter. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.

A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.

Rapid thermal processing (RTP) system with rotating substrate

A method for Rapid Thermal Processing (RTP) is presented, wherein the broadband reflectivity of an object is measured, and the results of the measurement used by the RTP system to adjust the RTP system parameters used in processing the object.

Method and apparatus for improved temperature control in rapid thermal

A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.

Method and apparatus for wavevector selective pyrometry in rapid thermal

A low defect rate is provided in rapid thermal processing of delicate components with reduction of defects caused by inhomogeneities of temperature during a rapid thermal processing. In a suitable system a defect-guarded RTP method is carried out in such a manner that the density of the heating energy is adjusted in consecutive intervals of time, which may be as short as desired, to such automatically controlled limiting values or to such fixed values that in the reaction chamber the difference between the primary and secondary energy densities is almost continuously held at the minimum which is achievable throughout the thermal processing whereas the ramps have predetermined slopes.

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Allmendingen, Germany

Heinrich Walk