Bayer Aktiengesellschaft

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Technische Universitaet Chemnitz

Basf Se Corporation

Heinrich Lang

Thomas Weiss

Sigurd Becke

Thomas Gessner

Stefan Schulz

Thomas Waechtler

Lars Wittenbecher

Alexander Jakob

Yingzhong Shen

Steve Mueller

André Tuchscherer

A method for producing a substrate with a copper or a copper-containing coating is disclosed. The method comprises a first step wherein a first precursor, a second precursor and a substrate are provided. The first precursor is a copper complex that contains no fluorine and the second precursor is selected from a ruthenium complex, a nickel complex, a palladium complex or mixtures thereof. In the second step, a layer is deposited at least on partial regions of a surface of the substrate by using the first precursor and the second precursor by means of atomic layer deposition (ALD). The molar ratio of the first precursor:second precursor used for the ALD extends from 90:10 to 99.99:0.01. The obtained layer contains copper and at least one of ruthenium, nickel and palladium. Finally, a reduction is performed step in which a reducing agent acts on the substrate obtained after depositing the copper-containing layer.

Method for the production of a substrate having a coating comprising copper, and coated substrate and device prepared by this method

A method can be used for the production of a coated substrate. The coating contains copper. A copper precursor and a substrate are provided. The copper precursor is a copper(I) complex which contains no fluorine. A copper-containing layer is deposited by means of atomic layer deposition (ALD) at least on partial regions of the substrate surface by using the precursor. Optionally, a reduction step is performed in which a reducing agent acts on the substrate obtained in the layer deposition step. In various embodiments, the precursor is a complex of the formula LCu(X&#x2229;X) in which L are identical or different &#x3c3;-donor-&#x3c0; acceptor ligands and/or identical or different &#x3c3;,&#x3c0;-donor-&#x3c0; acceptor ligands and X&#x2229;X is a bidentate ligand which is selected from the group consisting of &#x3b2;-diketonates, &#x3b2;-ketoiminates, &#x3b2;-diiminates, amidinates, carboxylates and thiocarboxylates.

Substrate having a coating comprising copper and method for the production thereof by means of atomic layer deposition

Copper (I) formate complexes of general formula LCu(HCOO).x COOH are decomposed in order to separate metallic copper, wherein x is a number from 0 to 10, n amounts to, 2, 3 or 4 and the n ligands L represent, independent of one another, one of the following ligands: a phosphane of formula RRRP; a phosphite of formula (RO)(RO)(RO)P; an isocyanide of formula R&#x2014;NC; an alkene of general formula RRC&#x2550;CRR; or an alkyne of general formula RC&#x2550;CR; wherein R, R, Rand Rrepresent, independent of one another, hydrogen, a linear or branched, optionally partly or fully fluorinated alkyl, aminoalkyl, alkyoxialkyl, hydroxialkyl, phosphinoalkyl or aryl radical having up to 20 carbon atoms, with the exception of triphenylphosphino-copper (I) formate and 1,1,1-tris(diphenylphosphinomethyl)ethane-copper (I) formate.

Copper(I) formate complexes

The present invention relates to organometallic compounds of transition metals with an indenyl ligand bonded in the 2-position and substituted in the 1,3-position, a process for their production, and their use as catalysts for the (co)polymerization of olefinic and/or diolefinic monomers.

1,3-disubstituted indene complexes

The present invention relates to transition metal organometallic compounds with an indenyl ligand attached in position 2 and fused in position 5,6, to a process for the production thereof and to the use thereof as catalysts for the (co)polymerization of olefinic and/or diolefinic monomers.

Organometallic compounds with fused indenyl ligands

Organometallic compounds of transition metals containing optionally tetrahydrogenated 2-indenyl as a first ligand of the formula

Growing community of inventors

Chemnitz-Harthau, Germany

Heinrich Lang