Carl Zeiss Microscopy Gmbh

Heiko Stegmann

Dirk Preikszas

Giuseppe Pavia

Tobias Volkenandt

Daniela Donhauser

Barry Chamley

Christian Mueller

A method for creating a trench with a defined intended trench depth in a sample uses a particle beam system configured to create a particle beam to ablate material from the sample. An exemplary method comprises: defining a particle beam system setting which is a setting of the particle beam system for implementing an ablation unit step with the particle beam; acquiring calibration data records using the defined particle beam system setting on a calibration sample; determining a regression curve based on the acquired calibration data records, the regression curve being defined on the basis of at least one parameter that characterizes the ablation unit step; determining an implementation number based on the determined regression curve and the intended trench depth; and creating a trench in the sample by repeatedly implementing the ablation unit step with the particle beam system setting in accordance with the determined implementation number.

Methods for creating a trench in a sample, and computer program product

A sample holder system for holding a microscopic sample in a microscope system comprises a first and a second rotation element, which are rotatably connected to one another. The side surfaces of the two rotation elements in each case enclose an angle α, with the result that the rotation elements have a wedge-shaped cross section. The second rotation element is configured to receive a sample, while the first rotation element can be rotatably connected to a holder receiving surface. The rotation elements are each rotatable by an angle β about a rotation axis. The inclination of the third side surface on which the sample can be received is settable by combining all of the involved angles α and β.

Sample holder system with freely settable inclination angles

A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.

Charged particle beam system and method

A method for processing an object, with material being removed from the object, includes directing a particle beam on the object so that a location of incidence of the particle beam on the object carries out a movement along a principal scanning path and a movement along a sub-scanning direction oriented transverse to the principal scanning path. The movement of the location of incidence of the particle beam along the sub-scanning direction is controlled on the basis of a reference signal and a detection signal. The method also includes modulating the directing of the particle beam in accordance with the reference signal, and detecting secondary particles and producing the detection signal, which represents an intensity of the detected secondary particles. Controlling the movement of the location of incidence of the particle beam along the sub-scanning direction is implemented using the principle of homodyne detection.

Method for processing an object

Methods and apparatus are disclosed for the preparation of microscopic samples using light pulses. Material volumes greater than 100 &#x3bc;mare removed. The methods include inspecting an object with a scanning electron microscope (SEM) or a focused ion beam (FIB). The inspection includes recording an image of the object. The methods also includes delineating within the object a region to be investigated, and delineating a laser-machining path based on the image of the object so that a sample can be prepared out of the object. The methods further include using laser-machining along the delineated laser-machining path to remove a volume that is to be ablated, and inspecting the object with the scanning electron microscope (SEM) or a focused ion beam (FIB).

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Dresden, Germany

Heiko Stegmann