Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Heiko Siekmann

Johannes Wangler

Michael Layh

Axel Scholz

Ralf Scharnweber

Markus Deguenther

Manfred Maul

Reinhard Voelkel

Kenneth Weible

Uwe Spengler

Andre Bresan

Nils Haverkamp

Michael Gerhard

Siegfried Rennon

Stefan Burkart

Oliver Wolf

Eva Kalchbrenner

Udo Dinger

Johannes Lippert

Holger Kierey

Martin Weiser

Claudia Ekstein

Holger Maltor

Andreas Schmehl

Reinhard Völkel

A method for producing a substrate () for an optical element () includes: introducing a starting material, preferably a metal or a semimetal, into a container and melting the starting material, producing a material body having a quasi-monocrystalline volume region () by directionally solidifying the molten starting material proceeding from a plurality of monocrystalline seed plates arranged in the region of a base of the container, and producing the substrate by processing the material body to form an optical surface (). An associated reflective optical element (), in particular for reflecting EUV radiation () includes: a substrate having an optical surface on which a reflective coating () is applied. The substrate is typically produced in accordance with the associated method and has a quasi-monocrystalline volume region ().

Method for producing a substrate for an optical element

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Illumination system for a microlithographic projection exposure apparatus

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body () and a polishing layer (). The polishing layer () has a thickness of less than 10 &#x3bc;m and a root-mean-square roughness of less than 0.5 nm and the main body () is produced from an aluminum alloy. Moreover, a highly reflective layer () is provided on the polishing layer () of the substrate () of the EUV mirror ().

Substrate for mirrors for EUV lithography

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

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Aalen, Germany

Heiko Siekmann