Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Heiko Knopf

Peter Munzert

Ulrike Schulz

Friedrich Rickelt

Norbert Kaiser

Kevin Füchsel

Hanno Heiβe

Sabrina Wolleb

Hanno Heiße

A method for producing a reflection-reducing layer system is disclosed. In an embodiment, a method includes depositing an organic layer on the substrate, generating a nanostructure in the organic layer by a plasma etching process, applying a cover layer to the nanostructure, wherein the organic layer, the nanostructure and the cover layer together form a reflection-reducing structure, wherein the cover layer comprises an inorganic material or an organosilicon compound, and wherein the cover layer is at least 5 nm thick and performing a post-treatment after applying the cover layer, wherein a material of the organic layer is at least partially removed, decomposed or chemically converted, and wherein an effective refractive index nof the reflection-reducing structure after the post-treatment is smaller than an effective refractive index nof the reflection-reducing structure before the post-treatment.

Method for producing a reflection-reducing layer system

A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.

Method for producing a reflection-reducing layer system and reflection-reducing layer system

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

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Jena, Germany

Heiko Knopf