Applied Materials, Inc.

Heike Landgraf

Stefan Bangert

Stefan Hein

Jose Manuel Dieguez-Campo

Florian Ries

Neil Morrison

Wolfgang Buschbeck

Hans-Georg Lotz

Tobias Stolley

Uwe Schüssler

Michael König

Uwe Schuessler

Michael Heumüller

Morrison Neil

Manuel Jose Dieguez-Campo

An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

Deposition platform for flexible substrates and method of operation thereof

An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.

Common deposition platform, processing station, and method of operation thereof

Mask carriers and mask alignment in vacuum deposition processes, mask handling modules, and methods for aligning a mask. A mask handling module can include a substrate carrier for carrying at least one substrate; a mask carrier for carrying at least two masks. The mask carrier can include at least two mask carrier sections each being adapted to carry a mask and a mask carrier positioning device for moving the mask carrier relative to the substrate carrier. The mask carrier sections are arranged so that the masks carried on the mask carrier sections can be positioned on the mask carrier in respective planes forming an angle with respect to each other so that only one of the at least two masks can be aligned to one of the at least one substrates.

Mask carrier, mask handling module and method for adjusting a mask

A mask supportcomprises a frame elementand an elastic element. The elastic elementis fixed to the frame element. The elastic elementis a component integrally formed of a flexible material. It comprises a lever or arm portionhaving a first engagement protrusionextending in an angle of approximately 90&#xb0; from the free end of the arm portion. A mask assemblycomprises a laminar mask, e.g. manufactured from a thin metal foil, and connecting elements. The connecting elementsinclude an engagement portionfor engagement with the engagement protrusionof the elastic element. The maskmay be attached/stretched to the mask supportas well as to detached from the mask supportcomfortably.

Mask support, mask assembly, and assembly comprising a mask support and a mask

A magnetic holding device is adapted for holding a mask during processing of a substrate. The magnetic holding device includes a substrate carrier which is adapted for receiving the substrate to be processed. The substrate carrier includes a permanent magnet adapted for generating a first magnetic field for holding the mask. Furthermore, the substrate carrier includes a solenoid which is adapted for generating a second magnetic field adapted for at least partially compensating the first magnetic field. In case the first magnetic field is compensated, at least partially, by means of the second magnetic field, the mask is released from the substrate carrier.

Magnetic holding device and method for holding a substrate

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Bruchkobel, Germany

Heike Landgraf