Korea Research Institute of Standards and Science

Hee Su Park

Dong-Hoon Lee

Sang Min Lee

Eun Joo Lee

Jae Yong Lee

Sun Kyung Lee

Sang-Kyung Choi

Hee Jung Lee

The present invention relates to a Bell state measurement apparatus capable of increasing a probability in which a determination that a Bell state measurement fails by using an optical fiber.

Bell state measurement apparatus based on single-mode optical fiber

According to one embodiment of the present invention, there is provided a photon generating apparatus including: a light source configured to emit light; an optical medium configured to generate a pair of photons from the light; a detector configured to detect one photon from the pair of photons and output a detection time of the photon; a buffer including an optical line and an optical switch disposed on an optical path of the photon, which is one photon except for the photon detected by the detector, of the pair of photons; and a processor configured to output a driving signal which controls the optical switch so that a delay occurs at the optical path using the detection time of the photon detected by the detector.

Photon generating apparatus

Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps. Furthermore, a multiple photon absorber that is difficult to obtain, a medium having a complicated energy level and a high-efficiency quantum optical light are unnecessary, and thus economic efficiency is improved.

Super-resolution lithography apparatus and method based on multi light exposure method

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Daejeon, South Korea

Hee Su Park