Korea Research Institute of Standards and Science

Hee Jung Yeom

Jung Hyung Kim

Hyo Chang Lee

Dae Jin Seong

The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.

Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried

Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to the plasma is varied in the range of 100 kHz to 500 MHz.

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Daejeon, South Korea

Hee Jung Yeom