Samsung Mobile Display Co., Ltd.

Hee Cheol Kang

Myung Soo Huh

Seok Heon Jeong

Do Geun Kim

Kwan Seop Song

Han Bit Kim

Sang Jin Han

Kazuo Furuno

Myoung Soo Kim

Tae Hyung Kim

Sung Ho Lee

Min Jae Jeong

Kyu Sung Lee

Eu Gene Kang

Ji Yong Lee

Jin Kyoo Kim

A catalyst enhanced chemical vapor deposition (CECVD) apparatus is provided in which the showerhead and catalyst support are separated from each other. The CECVD apparatus has excellent spacing between the showerhead, catalyst wire and substrate and can be purged to prevent contaminants from forming on parts functioning at low temperatures. The CECVD apparatus comprises a reaction chamber, a showerhead for introducing reaction gas into the reaction chamber, a catalyst wire for decomposing the reaction gas, a catalyst support for supporting the catalyst wire, a substrate on which the decomposed gas is deposited, and a substrate support for supporting the substrate.

Catalyst enhanced chemical vapor deposition apparatus

A vapor deposition source has a reduced size by disposing a crucible, a heating portion, and a nozzle portion in one defined space. A vapor deposition apparatus deposits deposition materials on a substrate using the vapor deposition source. The vapor deposition source includes a housing, and the crucible is mounted in the housing for vaporizing the deposition materials. The heating portion is installed adjacent to the crucible in the housing for heating the crucible. The nozzle portion injects the vaporized deposition materials into a substrate disposed at an exterior of the housing through an injection nozzle. The vapor deposition source is manufactured in a smaller and lightweight form in comparison with conventional vapor deposition sources in which a crucible and a nozzle portion are arranged in different spaces. The diameter and number of injection nozzles of the invention are restricted to block radiant heat discharged from the vapor deposition source, so that deposition materials are uniformly deposited. Furthermore, the output power of a conveyer for conveying the vapor deposition source is reduced. In addition, a plurality of vapor deposition sources is arranged in a line to perform concentrated deposition of deposition materials so that quality of the resultant product is improved.

Vapor deposition source and vapor deposition apparatus having the same

A linear type deposition source capable of improving a heating efficiency and reducing a heating temperature by using a plate-type heating source and/or improving a cooling efficiency by including a cooling jacket having a cooling water line in a housing. The linear type deposition source includes: a crucible arranged in a deposition chamber, the crucible being for evaporating materials included in the crucible; a heating source for applying heat to the crucible; a housing for isolating the heat emitted from the heating source; an outer wall for anchoring the crucible; and a nozzle unit for spraying the materials evaporated from the crucible. In this deposition source, the heating source is a plate-type heating source, and the housing has a cooling water line so cooling water can flow through the cooling water line.

Linear type deposition source

A film tray for fabricating a flexible display, the film tray preventing a flexible substrate or film from sagging. The film tray includes a support plate and at least one pair of clamps, each clamp of the at least one pair of clamps located along an opposite edge of the support plate to fix a flexible film. A first clamp of the at least one pair clamps is aligned with a second clamp of the least one pair of clamps. Each clamp includes an open-shut part adapted to be opened to receive the flexible substrate or film and adapted to be shut to fix the flexible substrate or film and a support part separated from the open-shut part by a predetermined space to support the flexible substrate or film at a predetermined level when the open-shut part is closed.

Film tray for fabricating flexible display

A method for in-situ polycrystalline thin film growth is provided. A catalyst enhanced chemical vapor deposition (CECVD) apparatus is used to grow the polycrystalline silicon thin film. No subsequent annealing or dehydrogenating process is needed. The method comprises exhausting a chamber to form a vacuum chamber, and then purging vacuum chamber and introducing a catalyst. A substrate is then placed in the vacuum chamber and reaction gas is injected into the chamber. The reaction gas reacts with the catalyst in the chamber to grow a polycrystalline thin film on the substrate. The inventive method reduces processing time and production cost and can be used to fabricate larger devices due to the elimination of bulky annealing equipment.

Method for in-situ polycrystalline thin film growth

Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.

Method of forming shadow mask pattern

A substrate support plate transfer apparatus for fabricating an organic light emitting display is disclosed. In one embodiment, the apparatus includes a quartz plate transferred into a bonding processing chamber for an organic light emitting device, a protection frame on which the quartz plate is placed in order to transfer the quartz plate into the chamber, and a frame-shaped supporting plate including a sliding transfer device for helping the transfer of the protection frame and installed in the chamber. The quartz plate has a rigidity capable of enduring pressure in the bonding process applied to a large sized substrate, and the apparatus provides for convenient replacement of the quartz plate.

Substrate support plate transfer apparatus for fabricating organic light emitting display

The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.

Growing community of inventors

Yongin, South Korea

Hee Cheol Kang