Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asml Netherlands B.v.

Hedser Van Brug

Huibert Visser

Jacobus Johannes Korpershoek

Ian J Saunders

Arno Jan Bleeker

Borgert Kruizinga

Gert-Jan Heerens

Hans Meiling

Jacques Cor Johan Van Der Donck

Hubert Adriaan Van Mierlo

Egbert Anne Martijn Brouwer

Robert Snel

Hugo Anton Marie De Haan

Frerik Van Beijnum

Antonius Gerardus Theodorus Maria Bastein

Bart Snijders

A detector system for spatially resolved detection of a gas substance in an area is described. The detector system includes a detector comprising an image sensor; a band filter arranged in an optical beam path before the detector for transferring a beam with a wavelength spectrum including an absorption wavelength corresponding to the gas substance, a telescope, a polarizing beam splitter, and an interferometric stage including a retarder for creating an optical path difference for measuring absorption dips due to the presence of the gas substance. The retarder includes multiple birefringent media arranged with the optical axes relative to each other so that at least one increases an optical path difference and at least one decreases an optical path difference between the polarized beam components, and the thicknesses of the birefringent media are tuned to minimize a focal shift between the polarized beam components.

Interferometric gas sensor

A telescope system () comprises a steering minor (M) arranged in a part of its optical path (L-L) between a first telescope stage () and a second telescope stage (). The steering mirror (M) is configured to controllably rotate over a rotation angle (&#x3b8;m) for controlling a view angle (&#x3b8;v) of the telescope system () from the entrance aperture (A). The steering mirror (M) is disposed at an intermediate pupil (Pi) of the telescope system (), at which position an image of the aperture stop (As) is formed by one or more of the optical components (M, M) there between.

Focal in-field pointing telescope system

Interferometer system, including optical means () arranged for directing light along a first interferometer path and (separate) second interferometer path, and for combining the light for allowing interferometry, characterized in that the first interferometer path (PI) is provided with a first light transmitting structure () having a rotational position that is adjustable with respect to an optical axis of the first path.

Interferometer system and use thereof

Correction optics () are disposed in an optical path directly behind an entry slit () of a spectrometer () and configured to warp a straight object line shape (A) of the entry slit () into a curved object line shape (B) from a point of view of the projection optics (). The warping of the correction optics () is configured such that a curvature (R) of the curved object line shape (B) counteracts an otherwise distorting curvature (R) in a projection (A) of the straight object line shape (A) by the projection optics () without the correction optics (). As a result, the spectrally resolved image (B) comprises a plurality of parallel straight projected line shapes formed by spectrally resolved projections of the straight object line shape (A).

Correction of curved projection of a spectrometer slit line

An aerosol detector system is described for spatially resolved detection of an aerosol distribution in an area. The system includes a wide field polarization preserving telescope having telecentric imaging optics for imaging the earth surface onto a detector that receives phase stepped images from the telescope, A controller is arranged to provide a resulting image as a function of corresponding pixel values of the multiple images to produce an image at a spatially resolved polarization state corresponding to said aerosol substance.

Spatially resolved aerosol detection

A monolithic spectrometer () for spectrally resolving light (L), comprises a body () of solid material having optical surfaces (-) configured to guide the light (L) along an optical path (E,E,E,E) inside the body (). The optical surfaces of the body () comprise a segmented focusing surface () comprising first and second continuously functional optical shapes (Ca,Cb) to focus received parts of respective beams (La,Lb) onto respective focal position (fa,fb) in an imaging plane (P) outside the body (). The second continuously functional optical shape (Cb) is separated from the first continuously functional optical shape (Ca) by an optical discontinuity (Dab) there between.

High resolution broadband monolithic spectrometer and method

The invention pertains to a method of spatially resolved detection of a gas substance in an area, comprising: imaging the area on a first image sensor, in a wavelength spectrum including an absorption wavelength peak corresponding to said gas substance; imaging the area on a second image sensor, to provide for each pixel of the first image a corresponding pixel of the second image for respective on- and off-peak wavelengths relative to the absorption wavelength; and providing a difference image as a function of the two pixel values of first and second image sensors to produce an image of the spatially resolved absorption wavelength corresponding to said gas substance.

Spatially resolved gas detection

The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.

Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample

A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.

Illumination of a patterning device based on interference for use in a maskless lithography system

A method of imaging radiation from an object on a detection device. The method includes directing a beam of coherent radiation to the object, scanning the beam of radiation over an angle in or out of a plane of incidence relative to the object, and imaging scattered radiation from the object on the detection device.

Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object

The invention relates to an apparatus for forming or working optical elements and/or optical forming elements () comprising a working apparatus () for forming surfaces of form parts by machining or an abrasive technique, wherein at least one measuring device () is provided for measuring changes in form and/or surface roughness of said surface when said surface is being worked and, on the basis thereof controlling said working apparatus ().

Apparatus and method for manufacturing optical objects

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.

Lithographic apparatus and method

A method for measuring a contour variation of a measuring area on an object. The method includes the steps of: irradiating the measuring area with a light beam, wherein reflection or transmission of the beam occurs; splitting the transmitted or reflected beam; combining the split beams with each other and observing a fringe pattern representing a differential phase between the split beams; varying the phase of the split beams relative to each other, such that the differential phase is kept within the range of 2 pi; calculating an optical path length difference from the differential phase; and relating the optical path length difference to the contour variation of the object.

Method for measuring contour variations

The invention relates to a method for machining a workpiece surface, wherein an area to be machined of the workpiece surface is machined under the influence of a polishing operation and wherein, during the machining, the displacement of the area to be machined relative to a reference area rigidly coupled to the workpiece surface is monitored by means of interferometry. The invention further relates to a machining apparatus, comprising a polishing tool and a measuring tool, while the measuring tool comprises an interferometer. Preferably, the polishing tool comprises a fluid jet polishing device.

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The Hague, Netherlands

Hedser Van Brug