Henkel Ag & Company, Kgaa

Studiengesellschaft Kohle Mbh

Henkel Ag & Co. Kgaa & Studiengesellschaft

Kohle Mbh

Hebert Jesus Estevez Rivera

Christian Kropf

Roberto Rinaldi

Hendrik Hellmuth

Alexander Schulz

Nicole Bode

Danuta Bedrunka

Surfactants of the general formula (I) in which Ris a linear or branched akyl radical having 6 to 20, especially 10 to 16 C atoms, Rand Rindependently of one another are H or HCO, and M is hydrogen, an alkali metal or a moiety NRRR, in which R, Rand Rindependently of one another are hydrogen, an alkyl group having 1 to 6 C atoms or a hydroxyalkyl group having 2 to 6 C atoms, are readily incorporated into laundry detergents or cleaning products, possess outstanding performance qualities and can be prepared on the basis of renewable raw materials. 

Anionic surfactants and detergents comprising them

Surfactants of general formula (I), in which Rdenotes a linear or branched alkyl residue having 6 to 20, and in particular 8 to 14 carbon atoms, Rdenotes H or CH, and M denotes hydrogen, an alkali metal or an NRRRgrouping, in which R, Rand R, independently of one another, denote hydrogen, an alkyl group having 1 to 6 carbon atoms or a hydroxyalkyl group having 2 to 6 carbon atom, can be easily incorporated into washing or cleaning agents, have outstanding application-related properties, and can be produced based on renewable resources.

Anionic surfactants and washing agents containing said surfactants

The invention relates to surfactants of the formula (I), in which Rstands for &#x2014;H or &#x2014;CH; R, R, R, R, Rindependently stand for &#x2014;H, &#x2014;CH, &#x2014;CHCH, &#x2014;CHCHCH, &#x2014;CH(CH), &#x2014;CHCHCHCH, &#x2014;CHCH(CH), &#x2014;CH(CH)CHCH, &#x2014;C(CH), &#x2014;OH, &#x2014;OCH, &#x2014;OCHCH, &#x2014;OCHCHCH, &#x2014;OCH(CH), a linear or branched alkyl group containing 8 to 20 C atoms, or &#x2014;SOX; Xstands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R, R, R, R, Rstands for &#x2014;SOX; and exactly one radical R, R, R, R, Rstands for a linear or branched alkyl radical containing 8 to 20 C atoms.

Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants

Growing community of inventors

Bochum, Germany

Hebert Jesus Estevez Rivera