Lam Research Corporation

Heather Landis

Karl Frederick Leeser

Shankar Swaminathan

Ramesh Chandrasekharan

Purushottam Kumar

Hu Kang

Frank Loren Pasquale

David Charles Smith

Jun Qian

Chloe Baldasseroni

Mohamed Sabri

Adrien LaVoie

Andrew Duvall

Jeremiah Baldwin

Jeongseok Ha

Eashwar Ranganathan

Ingi Bae

A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.

Systems and methods for vapor delivery in a substrate processing system

Growing community of inventors

Tigard, OR, United States of America

Heather Landis