University of Virginia Patent Foundation

Haydn N Wadley

James F Groves

Siegfried Schiller

Derek Hass

Henry Morgner

Goesta Mattausch

A process for vapor depositing an evaporant onto a substrate is provided which involves:

Production of nanometer particles by directed vapor deposition of

A process for vapor depositing an evaporant onto a substrate is provided which involves: presenting the substrate to a deposition chamber, wherein the deposition chamber has an operating pressure of from 0.001 Torr to atmospheric pressure and has coupled thereto a carrier gas stream generator and an electron beam gun capable of providing an electron beam at the operating pressure and contains an evaporant source; impinging the evaporant source with the electron beam to generate the evaporant; entraining the evaporant in the carrier gas stream; and coating the substrate with the carrier gas stream which contains the entrained evaporant, and an apparatus for performing the process.

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Keswick, VA, United States of America

Haydn N Wadley