Toa Nenryo Kogyo Kabushiki Kaisha

Tonen Corporation

Tao Nenryo Kogyo K.k.

Hayato Nishii

Takeshi Isoda

Osamu Funayama

Mikiro Arai

Masaaki Ichiyama

Yasuo Shimizu

Tadashi Suzuki

Hiroyuki Aoki

Yuuji Tashiro

Hiroshi Kaya

Tomohiro Kato

Ichiro Kohshi

Toshihide Kishi

Kouji Okuda

Tamio Ishiyama

Kouichi Yasuda

Atsuro Takazawa

A stabilized polysilazane obtained by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with an alcohol, an organic acid, an ester, a ketone, an aldehyde, a mercaptan, or an alkysilazane preferably at a molar ratio of from 50/50 to 99.99/0.01 is described.

Modified polysilazane and process for preparation thereof

Novel polysiloxazanes comprising [SiH.sub.2).sub.n NH-- and [SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).

Polysiloxazanes, silicon oxynitride fibers and processes for producing

A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.

Molded articles formed of silicon nitride based ceramic and process for

Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).

Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH-- and --SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mols % or more) and oxygen (5 mol % or more).

Novel polysiloxazanes comprising [(SiH.sub.2).sub.n NH] and [(SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).

Processes for producing polysiloxazanes and silicon oxynitride fibers

Silicon nitride fibers having a carbon content of 5 weight percent or less have high heat insulating properties and favorable mechanical properties and are useful as heat resistant, highly insulating materials or reinforcing agents for composite materials, particularly in the aerospace industry. Such high purity silicon nitride fibers are produced by spinning a solution of perhydropolysilazanes, an inert solvent and a spinning agent into fibers, preferably continuous fibers, and firing the spun fibers at 800.degree. to 1300.degree. C. in an inert atmosphere to form silicon nitride fibers of high purity.

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Iruma, Japan

Hayato Nishii