Ricoh Company, Ltd.

Haruo Hasegawa

Shiro Yamane

Hideaki Ema

Takao Igawa

Kenji Seki

Hiroyoshi Taniguchi

Tomoshi Nagayama

Electrophotographic light-sensitive member having a protective coating on a photoconductive layer of the light-sensitive member, said protective coating consisting of an organic high polymer containing Lewis acid.

Electrophotographic light-sensitive member with thin overlayer

The present invention provides a photosensitive material for use in electrophotography which is superior in durability, resistance to solvents and light sensitivity, which comprises a photoconductive layer consisting essentially of an inorganic or organic photoconductor and an ionizing radiation-curable resin as formed on a conductive support, said photoconductive layer having been cured by applying said radiation.

Photosensitive material for use in electrophotography with a radiation

Electrophotographic light-sensitive member

A photosensitive material comprising a conductive support provided with a photoconductive layer and a protective layer, wherein the protective layer contains an organic aluminum compound.

Electro photosensitive materials with a protective layer

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Kawasaki, Japan

Haruo Hasegawa