Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C O., Ltd.

Harunobu Matsui

Masaki Takeuchi

Daijitsu Harada

Hiroyuki Yamazaki

Shuhei Ueda

Daiyu Okafuji

Ryouhei Hasegawa

Atsushi Watabe

Masao Ando

The window material for an optical element of the present invention is formed of synthetic quartz glass that is likely to be subjected to shape processing, can be manufactured at low cost, and has a flat plate shape. Even if the window material for an optical element has a flat plate shape, for example, in a window material of a UV-LED such as a UVC-LED sealed with a surface mount package (SMD PKG), light emitted from the optical element, in particular, light having a light distribution angle can be efficiently collected when passing through the window material, and light collection equal to that of a window material having a lens shape such as a conventional convex shape can be achieved. Furthermore, light distribution without irradiation unevenness such as Lambertian reflection can also be achieved.

Window material for optical element, lid for optical element package, optical element package, and optical device

A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing AlO, a second layer containing HfO, and a third layer containing MgFor SiOsequentially laminated on the main surface of the synthetic quartz glass substrate.

Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation device

A synthetic quartz glass cavity member () is bonded to a substrate () having an optical device () mounted thereon such that the device may be accommodated in the cavity member. The cavity member () has an inside surface consisting of a top surface () opposed to the device () and a side surface (). The top surface () is a mirror surface and the side surface () is a rough surface.

Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods

A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate () and a metal or metal compound film (), and forming a metal base adhesive layer () on the metal or metal compound film (). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In.

Synthetic quartz glass lid precursor, synthetic quartz glass lid, and preparation methods thereof

A synthetic quartz glass lid is provided comprising a synthetic quartz glass and an adhesive formed on a periphery of a main surface of the window member. Further, an optical device package is provided comprising a box-shaped receptacle having an open upper end, an optical device received in the receptacle, and a window member of synthetic quartz glass bonded to the upper end of the receptacle with an adhesive. The adhesive is a low-melting metallic glass consisting of Te, Ag and at least one element selected from W, V, P, Ba, and Zr.

Synthetic quartz glass lid and optical device package

An optical device package comprising a receptacle, an optical device received therein, and a window member disposed forward of the receptacle in a light emitting direction of the optical device. The window member is a member of synthetic quartz glass having front and back surfaces, at least one of the front and back surfaces being a rough surface.

Window member for optical device package, optical device package, making methods, and optical device-mountable package

A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface.

Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same

Proposed herein is a method for producing substrates, particularly those of synthetic quartz glass, while saving the substrate surface from killer defects without resorting to any large-scale apparatus and precision polishing plate, thereby reducing defects and improving yields more than in production with conventional facilities. The method for producing substrates by polishing, includes steps of placing substrate stocks individually in work holes formed in a carrier on a lower polishing plate, bringing an upper polishing plate into contact with the surface of the substrate stocks, with the surface of the substrate stocks being coated with an impact-absorbing liquid and the lower polishing plate being rotated, and rotating the upper and lower polishing plates, with the surface of the substrate stocks being accompanied by a polishing slurry.

Method for producing substrates

A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.

Method of preparing substrate

In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.

Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same

A synthetic quartz glass substrate is prepared by immersing a starting substrate in an aqueous solution of a nonionic surfactant and precision polishing the substrate with a colloidal silica water dispersion. A synthetic quartz glass substrate having a few defects and low surface roughness is obtained while the polishing rate is improved and the polishing time is reduced.

Method of preparing synthetic quartz glass substrate

A rough surface of a starting synthetic quartz glass substrate is polished to a mirror finish, using a polishing slurry containing tetragonal or cubic zirconia.

Manufacture of synthetic quartz glass substrate

A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squares from the central surface area of 148 mm squares has a flatness of up to 150 nm.

Synthetic quartz glass substrate and making method

A method for recovery of cerium oxide from the abrasive waste composed mainly of cerium oxide arising from the polishing of glass substrates, said method including the steps of (i) adding to the abrasive waste an aqueous solution of a basic substance; (ii) adding to the resulting solution a precipitant, thereby forming precipitates composed mainly of cerium oxide, and removing the supernatant liquid; (iii) adding to the resulting precipitates a solution of an acid substance, thereby making said precipitate slightly acid to neutral; (iv) washing the precipitates with an organic solvent; and (v) drying and crushing the precipitates. The method males it possible to recycle abrasive waste into a pure abrasive composed mainly of cerium oxide which can be reused to polish synthetic quartz glass substrates for state-of-the-art semiconductor technology relating to photomasks and reticles.

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Joetsu, Japan

Harunobu Matsui