Micron Technology Incorporated

Harunobu Kondo

Kenichi Echigoya

Wataru Nobehara

Ryosuke Yatsushiro

Makoto Saito

Kazuteru Ishizuka

Disclosed herein is an apparatus that includes a semiconductor substrate having a main surface extending in a first direction and a second direction different from the first direction and a conductive pattern formed over the main surface of the semiconductor substrate. The conductive pattern includes a first section extending in the first direction, a second section extending in the second direction, and a third section connected between the first and second sections. The third section of the conductive pattern has a first slit extending in a third direction different from the first and second directions.

Semiconductor device having L-shaped conductive pattern

Apparatuses including compensation capacitors are described. An example apparatus includes: first, second and third capacitors arranged such that the second capacitor is sandwiched between the first and third capacitors, each of the first, second and third capacitors including first and second electrodes. The first electrodes of the first, second and third capacitors are electrically coupled in common to one another. The second electrodes of the first and third capacitors are electrically coupled in common to each other. The second electrode of the second capacitor is electrically insulated from the second electrodes of the first and third capacitors.

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Akita, Japan

Harunobu Kondo