Mitsui Toatsu Chemicals, Incorporated

Kabushiki Kaisha Toshiba

Asahi Glass Company, Limited

Optrex Corporation

Tokyo Electron Limited

The Nisshin Oillio Group, Ltd.

Tokyo Electron Tohoku Limited

Haruki Mori

Masao Ozeki

Shoichiro Ozaki

Tatsuro Yokoyama

Eiji Shidoji

Nobuya Kawauchi

Joji Kamiya

Tsutomu Katakami

Sadayuki Jimbo

Masaaki Ishii

Hiroyuki Yano

Haruo Okano

Masaru Hori

Keiji Horioka

Kazuhiro Tomioka

Hisataka Hayashi

Tadahito Nobori

Yasuhiro Ito

Hiroshi Kawazura

Yutaka Okazaki

Takafumi Kitano

Michihiko Miyamoto

Hideya Kobayashi

Ichiro Takasaki

Hitoshi Kato

Toshihiko Suzuki

Tokuhisa Ohiwa

Hiroyuki Yamashita

Akira Kobayashi

Takuo Nakano

Yukimasa Yoshida

Katsutoshi Ishikawa

Mikio Kumakura

Masanobu Arita

Junya Fujiwara

Yasuyuki Taniguchi

Kunio Sannohe

Tatsuo Shiotsuki

Yutaka Shimada

Yoshimasa Ike

Atsushi Kojima

Kanji Yoshihara

Takahiro Okuda

Kazutugu Aoki

Junichi Kakizaki

Junko Hosoya

Takashi Kitamori

Hitoshi Banno

Koji Shimomura

Tadashi Shinmura

Kenichi Fukuoka

Disclosed is an esterification reaction product which is capable of gelling both an oil agent and a cyclic silicone or a volatile dimethylpolysiloxane, or both an oil agent and a nonvolatile dimethylpolysiloxane. Also disclosed are a gelling agent contacting the esterification reaction product, and a cosmetic preparation containing the esterification reaction product or the gelling product and having an excellent feeling of use. Specifically, the cosmetic preparation contains, as a gelling agent, an esterification reaction product which is obtained by esterifying a component A that is a polyhydric alcohol or a condensate thereof, a component B that is a saturated dibasic acid having 10-28 carbon atoms, a component C that is a linear saturated fatty acid having 16-28 carbon atoms, and a component D that is a branched saturated fatty acid having 8-28 carbon atoms at a blending ratio (component A:component B) of 1.0 mole:0.10-0.20 mole.

Esterification reaction product, gelling agent containing the product, and cosmetic preparation containing them

In order to fabricate a light reflective structure for a liquid crystal display, a photosensitive resin layer is formed with use of a thermosetting photosensitive resin, the photosensitive resin layer is exposed through a photomask having a particular pattern by a proximity method, the exposed photosensitive resin layer is developed to form an insolubilized resin layer, and the insolubilized resin layer is subjected to a heat treatment to have surface smoothness improved and to accelerate setting of the resin layer.

Light reflective structure, method for producing the same and display

A transparent resisthaving a certain thickness is provided on a full reflection film 11at light reflection portions, and light reflection portionsare formed as holes having a certain depth, when one of the substrateshas an inner surface provided with the light reflection portionsmade of the full reflection filmand the light transmission portionsformed as openings without the full reflection layer, and a color filteris provided on each paired light reflection portionand light transmission portion

Transflective color liquid crystal display including color filters on transparent resists and method of fabricating a substrate therefor

A color liquid crystal display device has a liquid crystal layer of nematic liquid crystal having positive dielectric anisotropy and including a chiral material, which is interposed between two substrates disposed substantially in parallel, each provided with a transparent electrode and an aligning layer. The twist angle of the liquid crystal layer of liquid crystal molecules determined by the aligning layer of each of the substrates is 160&deg;-300&deg;. A pair of polarizing plates disposed outside the liquid crystal layer. A driving circuit applies a driving voltage across the transparent electrodes. A birefringent plate is disposed between the liquid crystal layer and an upper polarizing plates and a product &Dgr;n,&middot;d,of a refractive index anisotropy &Dgr;n,of the liquid crystal in the liquid crystal layer and a thickness d,of the liquid crystal layer is 1.2 &mgr;m-2.5 &mgr;m. The birefringent plate is formed to have a relation of nx&gE;n,&gE;n,wherein n,and n,respectively represent a refractive index (n,>n,) in a film plane direction of the birefringent plate, and n,represents a refractive index in the thickness direction of the birefringent plate (except for a case of n,&equals;n,&equals;n,). The birefringent plate has the sum &Dgr;n,&middot;d,of the refractive index anisotropy between a slow axis (a direction of n,in the film plane) and a fast axis (a direction of n,in the film plane), and birefringence in the thickness direction is 1.2 &mgr;m-2.5 &mgr;m. At least three voltage values are selected to be applied across the transparent electrodes by multiplexing driving.

Color liquid crystal display apparatus

A reflective type STN color liquid crystal display device having polarizers a liquid crystal layer a birefringent plate, an absorbing axis of upper polarizer, an absorbing axis of lower polarizer. Also include is the direction of a long axis of a liquid crystal molecule at an upper side of the liquid crystal layer, the direction of a long axis of a liquid crystal molecule at a lower side, a slow axis of birefringent plate, scanning electrodes of an N number, and data electrodes. Further B,&lE;P,&minus;2 is satisfied when P,&equals;N,&plus;1 and bias value B,&equals;(V,&plus;V,)/(V,).

Color liquid crystal display device

Reflection type color liquid crystal display apparatus

According to the present invention, there is provided an etching method comprising the steps of forming a first thin film on a surface of a substrate to be processed, supporting the substrate to be processed, forming a second thin film serving to deactivate an active gas used for etching the first thin film, on a surface of a mask plate piece used as the first thin film mask, fixing the mask plate piece so that the first thin film and the second thin film oppose to each other with a predetermined distance therebetween, and etching the first thin film by supplying the active gas to the first thin film via the mask plate piece.

Etching method and apparatus

A method for etching a silicon nitride film, includes the steps of supplying a fluorine radical, a compound of fluorine and hydrogen, and an oxygen radical close to a substrate having the silicon nitride film, and selectively etching the silicon nitride film from the substrate with the fluorine radical, the compound of fluorine and hydrogen, and the oxygen radical. A method for etching a silicon nitride film, includes the steps of exciting gas containing fluorine and oxygen gas, thereby generating a fluorine radical and an oxygen radical, supplying the fluorine radical and the oxygen radical close to a substrate having the silicon nitride film and supplying gas of a compound containing a hydroxyl close to the substrate, reacting the fluorine radical, the oxygen radical and the compound containing the hydroxyl, thereby generating a compound of the fluorine radical, the oxygen radical and a compound of fluorine and hydrogen, and selectively etching the silicon nitride film from the substrate with the compound of the fluorine radical, the oxygen radical and the compound of fluorine and hydrogen.

Method of etching silicon nitride film

The present invention relates to quinoline-4-carbonylguanidine derivative represented by formula (1) ##STR1## and pharmaceutically acceptable salt thereof, a process for producing the same, and a Na.sup.+ /H.sup.+ exchanger inhibitor containing the compound as an active ingredient. The compounds of the present invention are useful as an agent for treating or preventing various diseases by hyperfunction of the Na.sup.+ /H.sup.+ exchanger and as a diagnostic agent for these diseases.

Quinoline-4-carbonylguanidine derivatives, process for producing the

A dry-etching method comprising the steps of forming carbon film on a substrate to be etched, forming a resist pattern on said carbon thin film, selectively etching said carbon film using said resist pattern as a mask by a plasma of a gas mixture of a gas containing fluorine atoms and a gas containing oxygen atoms which are mixed at an atomic ratio of fluorine to oxygen of 198:1 to 1:2 so as to form a carbon film pattern, and selectively etching said substrate to be etched using said carbon film pattern as a mask or said resist pattern and said carbon film pattern as masks.

Method of manufacturing semiconductor device

A substrate processing apparatus comprising a process tube for enclosing a plurality of semiconductor wafers, injectors for introducing process gas into the process tube, a vacuum pump for exhausting the process tube, RF electrodes arranged along the outer circumference of the process tube and serving to generate high frequency electric field, when power is supplied, in a process-gas-introduced region so as to make process gas into plasmas, a high frequency power source for supplying power to the RF electrodes, heaters arranged in the process tube to directly heat the plural wafers, a power supply for supplying power to the heaters, and a controller for controlling the amount of power supplied from the power supply to the heaters.

Plasma processing apparatus etching tunnel-type

Pyrimidinedione derivatives of the formula: ##STR1## wherein R.sup.1 and R.sup.2 is so linked with each other as to make an alkylene chain and thus form a heterocyclic structure, A, R.sup.3, R.sup.4, X.sup.1, X.sup.2 and X.sup.3 are substituents, respectively, and n is 2 or 3 have a basic backbone in which a phenyl group part and a pyrimidinedione part are linked by a structure comprising an alkyl chain and a heterocyclic ring having two nitrogen atoms. These compounds are useful for a medical treatment of cardiac arrhythmias.

Pyrimidinedione derivatives and antiarrhythmic agents containing same

A pyrimidinedione derivative compound has a basic backbone in which a 4-oxobenzopyran ring group part and a pyrimidinedione part are linked by a structure comprising an alkyl chain containing at least two nitrogen atoms and one oxygen. The pyrimidinedione derivative is useful for a medical treatment of cardiac arrhythmias.

Pyrimidinedione derivative compounds, method for preparing same, and

Growing community of inventors

Hyogo, Japan

Haruki Mori