Fujifilm Corporation

Fuji Photo Film Company, Limited

Haruki Inabe

Hiromi Kanda

Shinichi Kanna

Hiromi Kobayashi

Kunihiko Kodama

Junichi Ito

Yushi Kaneko

Yuki Mizukawa

Akiyoshi Goto

Yoshiharu Yabuki

Kazuyoshi Mizutani

Yoshihiko Fujie

Tomoya Sasaki

Masaru Yoshikawa

Hiroaki Idei

Shoichi Nakamura

Kenta Ushijima

Kazuya Ota

Schinichi Kanna

Provided are a color filter including a colored pixel A including an aluminum phthalocyanine pigment and an ultraviolet absorbing layer which is provided on an optical path on a light incident side of the colored pixel A and has a wavelength region having a transmittance of 20% or less in a wavelength range of 300 to 450 nm, in which a transmittance in a wavelength region of 550 to 800 nm is 80% or more; and a solid-state imaging element and an image display device which include the color filter.

Color filter, solid-state imaging element, and image display device

A coloring composition includes a metal azo pigment, a compound having an ethylenically unsaturated bonding group, and a solvent, the metal azo pigment includes at least one kind of an anion selected from an azo compound represented by Formula (I) or an azo compound having a tautomeric structure of the azo compound represented by Formula (I), two or more kinds of metal ions, and a melamine compound, and in Formula (I), Rand Reach independently represent OH or NRR, Rand Reach independently represent &#x2550;O or &#x2550;NR, and Rto Reach independently represent a hydrogen atom or an alkyl group.

Coloring composition, film, color filter, solid-state imaging element, and image display device

A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

Positive resist composition and method of pattern formation with the same

A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.

A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and radiation.

Positive resist composition for immersion exposure and pattern-forming method using the same

The invention provides a colored curable composition including a dipyrromethene compound having a structure in which a polymerizable group and a carboxyl group are introduced in the same molecule, a resist liquid, an ink for inkjet printing, a color filter, a method of producing a color filter, a solid-state image sensor, a liquid crystal display, an organic EL display, an image display device and a colorant compound.

Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound

A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V&#x2267;230 and V/S&#x2266;0.93 taking van der Waals volume of the acid as V (&#x212b;), and van der Waals surface area of the acid as S (&#x212b;).

A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: 

Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter

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Shizuoka, Japan

Haruki Inabe