Trumpf Laser- Und Systemtechnik Gmbh

Hartmut Zefferer

Joachim Schulz

Martin Bea

A device for laser processing, in which the device includes: a laser including a resonator, the resonator being configured to generate a laser beam with a predetermined caustic during operation of the device; and an optical element to transform a laser beam generated by the resonator into a transformed laser beam having an annular intensity distribution in a plane perpendicular to a propagation direction of the transformed laser beam during operation of the device, in which the annular intensity distribution extends along the propagation direction of the transformed laser beam, and has, at a minimum diameter of a caustic of the transformed laser beam, a beam radius and a ring width corresponding to 50% of a maximum beam intensity in a radial direction of the transformed laser beam, and a ratio of the ring width to the beam radius is less than 0.6.

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Mühlacker, Germany

Hartmut Zefferer