Hoechst Aktiengesellschaft

Hartmut Steppan

Hans Ruckert

Gerhard Buhr

Ulrich Geissler

Hans-Dieter Frommeld

Harald Furrer

Gerhard Lohaus

Walter Lutz

Walter Herwig

Reinhard Doenges

Wolfgang Zahn

Barbara Wildenhain

A photopolymerizable mixture is described which contains a polymeric binder, a polymerizable compound and an acridine compound of the general formula I ##STR1## as photoinitiator, in which R.sup.1 denotes an optionally substituted alkyl or acyl group,

Photopolymerizable mixture and photopolymerizable copying material

Compounds of the general formula I ##STR1## are described in which R.sup.1 is a group of the formula ##STR2## and R.sup.2 is a hydrogen atom or a methyl group, or

Quinoline and acridine compounds effective as photoinitiators and

A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,

1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive

Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.

Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl

A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:

Radiation-polymerizable mixture

Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

Process for stripping light-hardened photoresist layers

A light-sensitive, diazonium group-containing polycondensation product is described which comprises

Light-sensitive, diazonium group-containing polycondensation product,

Photosensitive mixture and photosensitive recording material with

A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

Positive-working radiation-sensitive mixture

This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.

Process for the preparation of screen printing stencils by an

This invention relates to a photo-cross-linkable polymer containing units each having a 2-pyridone side group. The invention also relates to a photosensitive copying material including the novel photo-cross-linkable polymer.

Photopolymer having 2-pyridone side group

This invention relates to a light-sensitive copying composition for the preparation of screen printing stencils comprising a condensation product of an aromatic diazonium compound in admixture with a hydrophilic hardenable binder, the condensation product containing at least one unit each of the general types A(-D).sub.n and B which are connected by bivalent intermediate members derived from a condensable carbonyl compound, wherein

Diazo light-sensitive copying composition and process of using in the

Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1## Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.

Photosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers

This invention relates to a photo-crosslinkable polymer comprising units with side chains having 2-pyrone groups therein. The invention also relates to processes for the preparation of the novel photo-crosslinkable polymers and to a photo-curable copying composition including the photo-crosslinkable polymer.

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Wiesbaden, Germany

Hartmut Steppan