Carl-Zeiss-Smt Ag

Hartmut Muenker

Thomas Petasch

Bernhard Gellrich

Klaus-Dieter Klein

Toralf Gruner

Hubert Holderer

Ulrich Weber

Alexander Kohl

Christoph Zaczek

Martin Weiser

Jens Ullmann

The invention concerns an optical element () with an optical axis (), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (') in the direction of the optical axis (). A device () enables to induce a two-wave or multiple wave deformation in said optical element (). At least a system () mounted in the extension zone (&#x2032;) is designed to apply a force in said extension (&#x2032;).

Optical element with an optical axis

An apparatus for adjusting devices and for setting adjustments, in particular in a &#x3bc;m range, nm range and below, in particular of optical elements in semiconductor lithography, comprising a base part and a head part spaced apart therefrom, the two parts being connected to one another by at least one adjustment device, and the adjustment device having side parts, the angle of which, or the spacing between which, can be adjusted or set by a length-adjustment device.

Adjusting apparatus for devices and for setting adjustments

An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.

Apparatus for mounting an optical element in an optical system

A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90&#xb0;, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Catadioptric objective

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Aalen, Germany

Hartmut Muenker