Schott Ag

Other

Carl-zeiss-stiftung

Schott Pharma Schweiz Ag

Schott Pharma Ag & Co Kgaa

Hartmut Bauch

Matthias Bicker

Manfred Lohmeyer

Lars Bewig

Robert Hormes

Marten Walther

Eveline Rudigier-Voigt

Lutz Klippe

Martin Heming

Andrea Anton

Stefan Bauer

Burkhard Danielzik

Andreas Menzel

Thomas Küpper

Uwe Rothhaar

Roland Hochhaus

Markus Kuhr

Hans-Joachim Schmitt

Andreas Hahn

Andreas Voitsch

Tanja Woywod

Matthias Schmidt

Sylvia Biedenbender

Daniel Haines

Horst Koller

Rolf Martin

Wolfgang M&ouml;hl

Michael Waschbüsch

Luis Burzio

Michaela Klause

Jovana Djordjevic-Reiß

Jasmina Buki

Oliver Fratzer

Roland Scholz

Thomas Schindelbeck

Frank Rudiger

Hraban Hack

Florence Buscke

Sebastian Brechler

Thomas K{umlaut Over (u)}pper

Todd Gudgel

A coated glass container includes: a glass surface; and a coating that coats at least part of the glass surface to form a coated glass surface. The coating includes at least one layer. The coated glass container fulfills the following parameter: leaching of [Na] ions after an alkaline treatment is 10 mg/l or less [Na] ions.

Coated glass element

A pharmaceutical packaging including a silicone-free lubricating film of crosslinked organic molecules, and a method for producing same.

Pharmaceutical packaging with lubricating film and method for producing same

An apparatus and to a method for treating layers using a plasma zone sealed from the outer atmospheric pressure are provided. The apparatus and method include a plasma reactor including a substrate carrier in form of a container receiving means, and a closing element that is joined with the substrate carrier by means of a lifting device.

Plasma treatment apparatus for producing coatings

A pharmaceutical packaging comprising a silicone-free lubricating film of crosslinked organic molecules. The method for producing the pharmaceutical packaging comprises: applying a silicone-free organic fluid as a film on a surface of a hollow substrate for the lubricating film; placing the substrate in a vacuum reactor; evacuating the vacuum reactor; generating an alternating electromagnetic field by an AC voltage source; and introducing the alternating electromagnetic field into the interior of the substrate, a field strength thereof in the gas which is present in or introduced into the evacuated cavity of the substrate being sufficient to cause a homogeneous glow discharge under the pressure prevailing in the cavity of the substrate.

In order to improve the emptying of residual contents from containers, such as pharmaceutical packaging, the invention provides corresponding substrates with a hydrophobic coating. Provided for this purpose is a composite material which comprises a substrate and a coating deposited on it, which forms at least a part of the surface of the coated substrate, with the coating having a compound containing the elements C, O, and H, with further elements, apart from Si, C, H, having a content of less than 10 at %, preferably less than 5 at %, characterized in that this compound has a composition SiOCH, in which x is at most 1.2.

Container having improved ease of discharge product residue, and method for the production thereof

A method of preparing a macromolecule deterrent surface on a pharmaceutical package. In particular, the present invention relates to a method of preparing a protein deterrent surface on a pharmaceutical package by applying a coating or coatings directly to the pharmaceutical package that reduces the adsorption of proteins onto pharmaceutical packaging while not affecting the activity of the protein solution contained.

Method of preparing a macromolecule deterrent surface on a pharmaceutical package

A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature Tand a first pressure p. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure plower than the first pressure pand at a second temperature Tlower than the first temperature T, and the mixture is supplied from the intermediate storage device through a second gas line.

Gas supply method in a CVD coating system for precursors with a low vapor pressure

A device for producing optically homogeneous, streak-free quartz glass bodies having a large diameter including a furnace or melting device having an inner chamber with a pair of openings opposite one another. One or more movable burners are displaceable into one of the openings and the respective glass body to be produced is located in the other opening. Both the burner and glass body are movably positioned. In the course of the production of the quartz glass body, a relative movement is effected in the axial and radial directions between the burner and the quartz glass body such that the distance from the burner outlet opening pertaining to the quartz glass body decreases as the distance from the burner to the X-X axis of the quartz glass body increases.

Device for generating an optically homogeneous, streak-free quartz glass body having a large diameter

The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.

Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process

Growing community of inventors

Ober-Olm, Germany

Hartmut Bauch